Optical emission spectroscopy in diamond-like carbon film deposition

Vacuum ◽  
1991 ◽  
Vol 42 (16) ◽  
pp. 1083-1084
Author(s):  
Zhang Weiping ◽  
Chen Jing
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Carbon Film ◽  
Optical Emission ◽  
Film Deposition ◽  
Diamond Like Carbon ◽  
Diamond Like Carbon Film

scholarly journals Optical Emission Spectroscopy in Diamond-Like Carbon Film Deposition

1992 ◽  
Vol 8 (03) ◽  
pp. 383-388
Author(s):  
Zhang Wei-Ping ◽  
◽  
Chen Jing ◽  
Fang Rong-Chun ◽  
Hu Ke-Liang
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Carbon Film ◽  
Optical Emission ◽  
Film Deposition ◽  
Diamond Like Carbon ◽  
Diamond Like Carbon Film

Hybrid plasma system for diamond-like carbon film deposition

2000 ◽  
Vol 131 (1-3) ◽  
pp. 20-25 ◽  
Author(s):  
D Korzec ◽  
G Fedosenko ◽  
A Georg ◽  
J Engemann
Keyword(s):  
Carbon Film ◽  
Film Deposition ◽  
Diamond Like Carbon ◽  
Plasma System ◽  
Diamond Like Carbon Film ◽  
Hybrid Plasma

Optical Emission Spectroscopy Measurement of Ar\H2\CH4 RF Plasma for Nano-Crystal Diamond Film Deposition

2014 ◽  
Vol 1035 ◽  
pp. 373-378 ◽  
Author(s):  
Yan Chao Shi ◽  
Qin Jian Zhang ◽  
Jia Jun Li ◽  
Guang Chao Chen
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Diamond Films ◽  
Optical Emission ◽  
Film Deposition ◽  
Rf Plasma ◽  
Gas Mixture ◽  
Technical Application ◽  
Plasma Enhanced Cvd ◽  
Nano Crystal

Ar\H2\CH4 gas mixture was utilized to grow nanocrystal diamond films in a RF plasma enhanced CVD system. CH4\ H2 ratios were changed to study the effect of plasma radicals on the deposit, in which optical emission spectroscopy (OES) was applied to analyze the plasma radicals. It was found that Hα, Hβ, Hγ, CH, C2 were the main radicals in the plasma. Among them, the CH intensity of OES was usually quite strong and increased sharply when the ratio of CH4/H2 was greater than 3%. The intensity of C2 was weak and basically unchanged with the addition of methane. This study can provide a new possible technical application for depositing NCD films.

Dynamics of laser produced silver plasma under film deposition conditions studied using optical emission spectroscopy

1998 ◽  
Vol 125 (2) ◽  
pp. 227-235 ◽  
Author(s):  
Riju C. Issac ◽  
K. Vasudevan Pillai ◽  
S.S. Harilal ◽  
Geetha K. Varier ◽  
C.V. Bindhu ◽  
...  
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Film Deposition ◽  
Deposition Conditions
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