The influence of oxygen partial pressure and total pressure (O2 + Ar) on the properties of tin oxide films prepared by dc sputtering

Vacuum ◽

10.1016/0042-207x(94)90080-9 ◽

1994 ◽

Vol 45 (12) ◽

pp. 1191-1195 ◽

Author(s):

Li-jian Meng ◽

MP dos Santos

Keyword(s):

Oxygen Partial Pressure ◽

Partial Pressure ◽

Tin Oxide ◽

Total Pressure ◽

Oxide Films ◽

Dc Sputtering ◽

Tin Oxide Films

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Role of the oxygen partial pressure on the properties of undoped tin oxide films deposited at low temperature

physica status solidi (a) ◽

10.1002/pssa.200778930 ◽

2008 ◽

Vol 205 (8) ◽

pp. 1957-1960

Author(s):

P. Parreira ◽

J. Valente ◽

G. Lavareda ◽

C. Nunes de Carvalho ◽

A. R. Ramos ◽

...

Keyword(s):

Low Temperature ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Tin Oxide ◽

Oxide Films ◽

Tin Oxide Films

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Influence of Substrate Orientation and Oxygen Partial Pressure on the Morphology, Structure, and Electrical Property of Epitaxial Indium Tin Oxide Films

Crystal Growth & Design ◽

10.1021/acs.cgd.1c00447 ◽

2021 ◽

Author(s):

Qiaonan Yu ◽

Gaige Huang ◽

Guoqiang Li

Keyword(s):

Electrical Property ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Substrate Orientation ◽

Influence Of Substrate ◽

Tin Oxide Films

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Effect of oxygen partial pressure on the microstructural and physical properties on nanocrystalline tin oxide films grown by plasma oxidation after thermal deposition from pure Sn targets

Vacuum ◽

10.1016/j.vacuum.2008.06.007 ◽

2008 ◽

Vol 83 (2) ◽

pp. 292-301 ◽

Author(s):

Mirac Alaf ◽

Mehmet Oguz Guler ◽

Deniz Gultekin ◽

Mehmet Uysal ◽

Ahmet Alp ◽

...

Keyword(s):

Physical Properties ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Tin Oxide ◽

Oxide Films ◽

Plasma Oxidation ◽

Thermal Deposition ◽

Effect Of Oxygen ◽

Pure Sn ◽

Tin Oxide Films

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Electrical and structural properties of indium tin oxide films deposited by reactive DC sputtering

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/28/7/024 ◽

1995 ◽

Vol 28 (7) ◽

pp. 1448-1453 ◽

Author(s):

M Rottmann ◽

K -H Heckner

Keyword(s):

Structural Properties ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Dc Sputtering ◽

Tin Oxide Films

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Deposition Of Transparent Conducting Indium - Tin Oxide Films By Dc Sputtering

10.1117/12.936295 ◽

1983 ◽

Author(s):

S. S. Bawa ◽

S. S. Sharma ◽

S. A. Agnihotry ◽

A. M. Biradar ◽

Subhas Chandra

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Dc Sputtering ◽

Transparent Conducting ◽

Tin Oxide Films

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Deposition of transparent and conducting indium-tin-oxide films by the r.f.-superimposed DC sputtering technology

Thin Solid Films ◽

10.1016/s0040-6090(99)00558-1 ◽

1999 ◽

Vol 354 (1-2) ◽

pp. 100-105 ◽

Author(s):

M. Bender ◽

J. Trube ◽

J. Stollenwerk

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Dc Sputtering ◽

Tin Oxide Films

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Modification of Structure and Properties in Indium Tin Oxide Films Deposited by Rf-plasma-assisted Pulsed Dc Sputtering

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.52.364 ◽

2009 ◽

Vol 52 (6) ◽

pp. 364-368

Author(s):

Toshiyuki OYA ◽

Eiji KUSANO

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Rf Plasma ◽

Structure And Properties ◽

Dc Sputtering ◽

Pulsed Dc ◽

Tin Oxide Films

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X-ray study of tin oxide films obtained by reactive DC sputtering from a metallic tin target in pure oxygen plasma

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2006.10.001 ◽

2007 ◽

Vol 201 (8) ◽

pp. 4659-4665 ◽

Author(s):

A. Martel ◽

F. Caballero-Briones ◽

P. Quintana ◽

P. Bartolo-Pérez ◽

J.L. Peña

Keyword(s):

Tin Oxide ◽

Oxygen Plasma ◽

Oxide Films ◽

Pure Oxygen ◽

X Ray ◽

Dc Sputtering ◽

Tin Oxide Films

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Study Of Indium Tin Oxide Films Exposed To Atomic Oxygen

10.1117/12.960955 ◽

1989 ◽

Author(s):

Paul G. Snyder ◽

Bhola N. De ◽

John A. .. WoolIam ◽

T. J. Coutts ◽

X. Li

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Atomic Oxygen ◽

Oxide Films ◽

Tin Oxide Films

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Indium tin oxide films with low resistivity and low internal stress

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1563623 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1351-1354 ◽

Author(s):

Shinji Takayama ◽

Toshifumi Sugawara ◽

Akira Tanaka ◽

Tokuji Himuro

Keyword(s):

Internal Stress ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Low Resistivity ◽

Tin Oxide Films

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