Role of the oxygen partial pressure on the properties of undoped tin oxide films deposited at low temperature

2008 ◽  
Vol 205 (8) ◽  
pp. 1957-1960
Author(s):  
P. Parreira ◽  
J. Valente ◽  
G. Lavareda ◽  
C. Nunes de Carvalho ◽  
A. R. Ramos ◽  
...  
Keyword(s):  
Low Temperature ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films

Development of higher performance indium tin oxide films at a very low temperature (<80°C) by the neutral beam-assisted sputtering process

2011 ◽  
Vol 519 (7) ◽  
pp. 2098-2102 ◽  
Author(s):  
Jin Nyoung Jang ◽  
You Jong Lee ◽  
Jun Young Lee ◽  
Yun Sung Jang ◽  
MunPyo Hong ◽  
...  
Keyword(s):  
Low Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Neutral Beam ◽  
Tin Oxide Films ◽  
Very Low Temperature

Pulsed-magnetron-sputtered low-temperature indium tin oxide films for flat-panel display applications

2002 ◽  
Vol 31 (2) ◽  
pp. 129-135 ◽  
Author(s):  
William J. Lee ◽  
Yean-Kuen Fang ◽  
Jyh-Jier Ho ◽  
Chin-Ying Chen ◽  
Rung-Ywan Tsai ◽  
...  
Keyword(s):  
Low Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Flat Panel Display ◽  
Flat Panel ◽  
Tin Oxide Films ◽  
Pulsed Magnetron
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