Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions

1993 ◽  
Vol 70-71 ◽  
pp. 707-711 ◽  
Author(s):  
K. Ellmer ◽  
F. Kudella ◽  
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pp. 2611-2614 ◽  
Author(s):  
Z.B. Fang ◽  
Y.S. Tan ◽  
H.X. Gong ◽  
C.M. Zhen ◽  
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2002 ◽  
Vol 41 (Part 1, No. 2A) ◽  
pp. 814-819 ◽  
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