Investigation of the dosage effect on the activation of arsenic- and boron-implanted low-pressure chemical vapor deposition (LPCVD) amorphous-silicon films
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1990 ◽
Vol 8
(1)
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pp. 10
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1994 ◽
Vol 33
(Part 2, No. 9A)
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pp. L1254-L1256
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2000 ◽
Vol 266-269
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pp. 689-693
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