Electronic excitation and ionization temperature measurements in a high frequency inductively coupled argon plasma source and the influence of water vapour on plasma parameters

1980 ◽  
Vol 35 (4) ◽  
pp. 163-175 ◽  
Author(s):  
J.F. Alder ◽  
R.M. Bombelka ◽  
G.F. Kirkbright
Keyword(s):  
Water Vapour ◽  
High Frequency ◽  
Electronic Excitation ◽  
Argon Plasma ◽  
Plasma Source ◽  
Temperature Measurements ◽  
Plasma Parameters ◽  
Inductively Coupled ◽  
Ionization Temperature ◽  
Influence Of Water

Three-Dimensional Discharge Simulation of Inductively Coupled Plasma Etcher

2007 ◽  
Author(s):  
Jia Cheng ◽  
Yu Zhu ◽  
Guanghong Duan ◽  
Yangying Chen
Keyword(s):  
Electron Temperature ◽  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Argon Plasma ◽  
Plasma Parameters ◽  
Inductively Coupled ◽  
Parameters Selection ◽  
Dimensional Distribution ◽  
Discharge Model ◽  
Discharge Simulation

Based on the commercial software, CFD-ACE+, a three-dimensional discharge model of an inductively coupled plasma (ICP) etcher was built. The spatial distributions of the electron temperature and the electron number density (END) of the argon plasma were simulated at 10 mTorr, 200 W and 200 sccm. One-dimensional distribution profiles of the plasma parameters above the wafer’s surface at different pressures and powers were compared. These results demonstrate that the END increases with both pressure and power. And the electron temperature decreases with pressure. The methods and conclusions can be used to provide some reference for the configurations of the chamber and the coil of the ICP equipment design and improvement and process parameters selection.

Evaluation of the Axially Viewed (End-on) Inductively Coupled Argon Plasma Source for Atomic Emission Spectroscopy

1979 ◽  
Vol 33 (6) ◽  
pp. 584-591 ◽  
Author(s):  
D. R. Demers
Keyword(s):  
Inductively Coupled Plasma ◽  
Matrix Effects ◽  
Argon Plasma ◽  
Detection Limits ◽  
Plasma Source ◽  
Atomic Emission ◽  
Orifice Diameter ◽  
Aqueous Samples ◽  
Inductively Coupled ◽  
Optimal Observation

A comparison of an “end-on” viewed argon inductively coupled plasma (ICP) operated in the horizontal position with the conventional “side-on” viewed argon ICP was carried out using the same experimental setup. The end-on ICP required an air cutoff stream located toward the tip of the luminous discharge, to protect the optics and to increase linearity ranges, and the orifice diameter of the central tube of the torch was widened to 1.9 mm, to improve line/background ratios. With the end-on viewed plasma the linearity ranges, the susceptibility to solute vaporization and to ionization matrix effects, and the detection limits in an organic solvent were insignificantly different from those observed with the side-on viewed plasma. Detection limits with aqueous samples were always significantly lower with the end-on viewed plasma, usually five- to tenfold lower, in a few instances, 20-fold lower. With the end-on viewed plasma the optimal observation region for both single and simultaneous multielement analysis is one and the same and is extremely easy to locate.

Characterization of a high-frequency inductively coupled plasma source

2006 ◽  
Vol 506-507 ◽  
pp. 469-473 ◽  
Author(s):  
D.S. Lee ◽  
H.S. Jun ◽  
H.Y. Chang
Keyword(s):  
High Frequency ◽  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Inductively Coupled
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