Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications

2020 ◽  
pp. 153-182
Author(s):  
Hongfei Liu ◽  
Chandreswar Mahata
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Metal Thin Films ◽  
Layer Deposition ◽  
Layer Adsorption ◽  
Ionic Layer

Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium

2021 ◽  
Author(s):  
Stefan Cwik ◽  
Keenan N. Woods ◽  
S. Sameera Perera ◽  
Mark J. Saly ◽  
Thomas J. Knisley ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Thin Films ◽  
Layer Deposition

The growth of rhenium nitride and rhenium metal thin films is presented using atomic layer deposition (ALD) with the precursors methyltrioxorhenium and 1,1-dimethylhydrazine. Saturative, self-limiting growth was determined at 340...

Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films

2018 ◽  
Vol 10 (16) ◽  
pp. 14200-14208 ◽  
Author(s):  
Marissa M. Kerrigan ◽  
Joseph P. Klesko ◽  
Kyle J. Blakeney ◽  
Charles H. Winter
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nickel Metal ◽  
Metal Thin Films ◽  
Layer Deposition

scholarly journals Thermal atomic layer deposition of ruthenium metal thin films using nonoxidative coreactants

2020 ◽  
Vol 38 (1) ◽  
pp. 012402
Author(s):  
Stefan Cwik ◽  
Keenan N. Woods ◽  
Mark J. Saly ◽  
Thomas J. Knisley ◽  
Charles H. Winter
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Thin Films ◽  
Layer Deposition

Anti-Reflection Properties of Black Silicon Coated with Thin Films of Metal Oxides by Atomic Layer Deposition

2021 ◽  
Vol 56 (3) ◽  
pp. 240-246
Author(s):  
G. Y. Ayvazyan ◽  
M. V. Katkov ◽  
M. S. Lebedev ◽  
V. R. Shayapov ◽  
M. Yu. Afonin ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Black Silicon ◽  
Layer Deposition

scholarly journals Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

2018 ◽  
Vol 30 (10) ◽  
pp. 3499-3507 ◽  
Author(s):  
Katja Väyrynen ◽  
Timo Hatanpää ◽  
Miika Mattinen ◽  
Mikko Heikkilä ◽  
Kenichiro Mizohata ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Cobalt Metal ◽  
Metal Thin Films ◽  
Layer Deposition
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