Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED)

Author(s):  
G. Koster ◽  
M. Huijben ◽  
A. Janssen ◽  
G. Rijnders
2003 ◽  
Vol 52 (10) ◽  
pp. 2601
Author(s):  
Chen Ying-Fei ◽  
Peng Wei ◽  
Li Jie ◽  
Chen Ke ◽  
Zhu Xiao-Hong ◽  
...  

2000 ◽  
Vol 87 (9) ◽  
pp. 5693-5695 ◽  
Author(s):  
Dmitri Litvinov ◽  
J. Kent Howard ◽  
Sakhrat Khizroev ◽  
Heng Gong ◽  
David Lambeth

1999 ◽  
Vol 585 ◽  
Author(s):  
T. Matsumoto ◽  
K. Mimoto ◽  
M. Kiuchi ◽  
S. Sugimoto ◽  
S. Goto

AbstractSiC thin films were formed on Si (111) at growth temperatures of 750–1000 °C using the molecular ion beam technique, with a precursor of methylsilicenium ions (SiCH3+). The chemical bindings and surface structures of SiC thin films were analyzed by Raman spectroscopy and reflection high-energy electron diffraction. As a result, 3C-SiC (111) was grown on Si (111) substrates without carbonized treatments.


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