Synthesis and characterization of porous crystalline SiC thin films prepared by radio frequency reactive magnetron sputtering technique

2011 ◽  
Vol 257 (15) ◽  
pp. 6923-6927 ◽  
Author(s):  
Afzaal Qamar ◽  
Arshad Mahmood ◽  
Tuba Sarwar ◽  
Nadeem Ahmed
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Reactive Magnetron Sputtering ◽  
Synthesis And Characterization ◽  
Reactive Magnetron

scholarly journals Synthesis and characterization of single-phase epitaxial Cr2N thin films by reactive magnetron sputtering

2018 ◽  
Vol 54 (2) ◽  
pp. 1434-1442 ◽  
Author(s):  
M. A. Gharavi ◽  
G. Greczynski ◽  
F. Eriksson ◽  
J. Lu ◽  
B. Balke ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Single Phase ◽  
Reactive Magnetron Sputtering ◽  
Synthesis And Characterization ◽  
Reactive Magnetron

Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

2007 ◽  
Vol 124-126 ◽  
pp. 999-1002 ◽  
Author(s):  
Han Na Cho ◽  
Jang Woo Lee ◽  
Su Ryun Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Visible Region ◽  
Film Surface ◽  
Optical Transmittance ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Indium Zinc Oxide

Indium zinc oxide (IZO) thin films were deposited on a glass substrate by radio frequency (rf) reactive magnetron sputtering method. As the rf power increased, the deposition rate and resistivity increased while the optical transmittance decreased owing to the increase of grain size. With increasing gas pressure, the resistivity increased and the transmittance decreased. Atomic force microscopy and scanning electron microscopy were employed to observe the film surface. The IZO films displayed a resistivity of 3.8 × 10-4 Ω cm and a transmittance of about 90% in visible region.

Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

2011 ◽  
Vol 13 (2) ◽  
pp. 314-320 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
A. Sivasankar Reddy ◽  
Kee-Sun Lee ◽  
P. Sreedhara Reddy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering

2009 ◽  
Vol 518 (1) ◽  
pp. 77-83 ◽  
Author(s):  
Matthias Krause ◽  
Laurent Bedel ◽  
Anthony Taupeau ◽  
Ulrich Kreissig ◽  
Frans Munnik ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Mechanical Characterization ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron
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