Characterization of the silicon oxide thin films deposited on polyethylene terephthalate substrates by radio frequency reactive magnetron sputtering

2007 ◽  
Vol 515 (11) ◽  
pp. 4596-4602 ◽  
Author(s):  
M.-C. Lin ◽  
C.-H. Tseng ◽  
L.-S. Chang ◽  
D.-S. Wuu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Polyethylene Terephthalate ◽  
Silicon Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films

Modeling the thickness distribution of silicon oxide thin films grown by reactive magnetron sputtering

2019 ◽  
Vol 52 (49) ◽  
pp. 495201
Author(s):  
J Cruz ◽  
R Sanginés ◽  
N Abundiz-Cisneros ◽  
J Aguila-Muñoz ◽  
S Muhl ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Silicon Oxide ◽  
Thickness Distribution ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films

Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

2010 ◽  
Vol 8 (S1) ◽  
pp. 73-77 ◽  
Author(s):  
Stefan Jakobs Stefan Jakobs ◽  
Marc Lappschies Marc Lappschies ◽  
Uwe Schallenberg Uwe Schallenberg ◽  
Olaf Stenzel Olaf Stenzel ◽  
Steffen Wilbrandt Steffen Wilbrandt
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Metal Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films

Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

2007 ◽  
Vol 124-126 ◽  
pp. 999-1002 ◽  
Author(s):  
Han Na Cho ◽  
Jang Woo Lee ◽  
Su Ryun Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Visible Region ◽  
Film Surface ◽  
Optical Transmittance ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Indium Zinc Oxide

Indium zinc oxide (IZO) thin films were deposited on a glass substrate by radio frequency (rf) reactive magnetron sputtering method. As the rf power increased, the deposition rate and resistivity increased while the optical transmittance decreased owing to the increase of grain size. With increasing gas pressure, the resistivity increased and the transmittance decreased. Atomic force microscopy and scanning electron microscopy were employed to observe the film surface. The IZO films displayed a resistivity of 3.8 × 10-4 Ω cm and a transmittance of about 90% in visible region.

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