Effect of reaction parameters on the growth of MWCNTs using mesoporous Sb/MCM-41 by chemical vapour deposition

2011 ◽  
Vol 258 (3) ◽  
pp. 1045-1051 ◽  
Author(s):  
R. Atchudan ◽  
A. Pandurangan ◽  
K. Subramanian
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Reaction Parameters ◽  
Mcm 41

scholarly journals Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4

2021 ◽  
Vol 8 (4) ◽  
Author(s):  
Daniel Kast ◽  
Gerhard Franz ◽  
Jay J. Senkevich
Keyword(s):  
Nuclear Magnetic Resonance ◽  
Supply Chain ◽  
Magnetic Resonance ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Laboratory Scale ◽  
Reaction Parameters ◽  
Microwave Assisted ◽  
Quantitative Nuclear Magnetic Resonance

In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between different reaction parameters and solvents is drawn by means of thermal, laboratory-scale and microwave-assisted reactions and quantitative nuclear magnetic resonance (qNMR) studies.

scholarly journals The Impact of Reaction Parameters on Graphene-like Material Synthesized Using Chemical Vapour Deposition

2017 ◽  
Vol 184 ◽  
pp. 460-468 ◽  
Author(s):  
H. Cheun Lee ◽  
Wei-Wen Liu ◽  
Siang-Piao Chai ◽  
Abdul Rahman Mohamed ◽  
C.H. Voon ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Reaction Parameters ◽  
The Impact

Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-395-Pr8-402 ◽  
Author(s):  
B. Armas ◽  
M. de Icaza Herrera ◽  
C. Combescure ◽  
F. Sibieude ◽  
D. Thenegal
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Cold Wall ◽  
Pressure Chemical ◽  
Mullite Coatings

Thermodynamical and experimental conditions of hafnium carbide chemical vapour deposition

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-373-Pr8-380 ◽  
Author(s):  
P. Sourdiaucourt ◽  
A. Derré ◽  
P. Delhaès ◽  
P. David
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hafnium Carbide ◽  
Experimental Conditions
Sign in / Sign up

Export Citation Format

Share Document