scholarly journals Electrical resistivity and elastic wave propagation anisotropy in glancing angle deposited tungsten and gold thin films

2019 ◽  
Vol 475 ◽  
pp. 606-614 ◽  
Author(s):  
Raya El Beainou ◽  
Asma Chargui ◽  
Paulo Pedrosa ◽  
Alexis Mosset ◽  
Sébastien Euphrasie ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Wave Propagation ◽  
Elastic Wave ◽  
Elastic Wave Propagation ◽  
Glancing Angle ◽  
Gold Thin Films

scholarly journals Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films

Nanomaterials ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 81 ◽  
Author(s):  
Asma Chargui ◽  
Raya El Beainou ◽  
Alexis Mosset ◽  
Sébastien Euphrasie ◽  
Valérie Potin ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Wave Propagation ◽  
Film Thickness ◽  
Elastic Wave ◽  
Structural Characteristics ◽  
Elastic Wave Velocity ◽  
Elastic Wave Propagation ◽  
Constant Thickness ◽  
Β Phase ◽  
Porous Architecture

Tungsten films were prepared by DC magnetron sputtering using glancing angle deposition with a constant deposition angle α = 80°. A first series of films was obtained at a constant pressure of 4.0 × 10−3 mbar with the films’ thickness increasing from 50 to 1000 nm. A second series was produced with a constant thickness of 400 nm, whereas the pressure was gradually changed from 2.5 × 10−3 to 15 × 10−3 mbar. The A15 β phase exhibiting a poor crystallinity was favored at high pressure and for the thinner films, whereas the bcc α phase prevailed at low pressure and for the thicker ones. The tilt angle of the columnar microstructure and fanning of their cross-section were tuned as a function of the pressure and film thickness. Electrical resistivity and surface elastic wave velocity exhibited the highest anisotropic behaviors for the thickest films and the lowest pressure. These asymmetric electrical and elastic properties were directly connected to the anisotropic structural characteristics of tungsten films. They became particularly significant for thicknesses higher than 450 nm and when sputtered particles were mainly ballistic (low pressures). Electronic transport properties, as well as elastic wave propagation, are discussed considering the porous architecture changes vs. film thickness and pressure.

scholarly journals Active tuning of elastic wave propagation in a piezoelectric metamaterial beam

AIP Advances ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 065009
Author(s):  
Xi-Ning Zhao ◽  
Xiao-Dong Yang ◽  
Wei Zhang ◽  
Huayan Pu
Keyword(s):  
Wave Propagation ◽  
Elastic Wave ◽  
Elastic Wave Propagation

Elastic wave propagation in hierarchical lattices with convex and concave hexagons stacked vertexes

2019 ◽  
Vol 146 (3) ◽  
pp. 1519-1527 ◽  
Author(s):  
ZhiWei Zhu ◽  
ZiChen Deng ◽  
ShuZhan Tong ◽  
BenJie Ding ◽  
JianKe Du
Keyword(s):  
Wave Propagation ◽  
Elastic Wave ◽  
Elastic Wave Propagation ◽  
Hierarchical Lattices
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