Interplay between grain boundary diffusion and annealing temperature on the conductivity of NiO coated Samarium doped ceria

2019 ◽  
Vol 481 ◽  
pp. 1394-1402 ◽  
Author(s):  
Sushil Kumar Kuanr ◽  
G. Vinothkumar ◽  
U. Aarthi ◽  
K. Suresh Babu
1994 ◽  
Vol 343 ◽  
Author(s):  
M. Gall ◽  
J.G. Pellerin ◽  
P.S. Ho ◽  
K.R. Coffey ◽  
J.K. Howard

ABSTRACTX-ray photoelectron spectroscopy (XPS) has been used to investigate grain boundary diffusion of Ag through 250 Å thick Ni80Fe20 (permalloy) films in the temperature range of 375 to 475°C. Grain boundary diffusivities were determined by modeling the accumulation of Ag on Ni80Fe20 surfaces as a function of time at fixed annealing temperature. The grain boundary diffusivity of Ag through Ni80Fe20 is characterized by a diffusion coefficient prefactor, D0,gb, of 0.9 cm2/sec and an activation energy, Ea,gb, of 2.2 eV. The Ni80Fe20 film microstructure has been investigated before and after annealing by atomic force microscopy and x-ray diffraction. The microstructure of Ni80Fe20 deposited on Ag underlayers remained relatively unchanged upon annealing.


1990 ◽  
Vol 51 (C1) ◽  
pp. C1-691-C1-696 ◽  
Author(s):  
K. VIEREGGE ◽  
R. WILLECKE ◽  
Chr. HERZIG

2005 ◽  
Vol 96 (10) ◽  
pp. 1187-1192 ◽  
Author(s):  
Raymond J. Kremer ◽  
Mysore A. Dayananda ◽  
Alexander H. King

2001 ◽  
Vol 89 (7) ◽  
pp. 3971-3975 ◽  
Author(s):  
Z. Erdélyi ◽  
Ch. Girardeaux ◽  
G. A. Langer ◽  
D. L. Beke ◽  
A. Rolland ◽  
...  

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