Structural and electrical properties of fluorine-doped zinc tin oxide thin films prepared by radio-frequency magnetron sputtering

Current Applied Physics ◽

10.1016/j.cap.2014.03.020 ◽

2014 ◽

Vol 14 (6) ◽

pp. 850-855 ◽

Author(s):

R. Pandey ◽

S.H. Cho ◽

D.K. Hwang ◽

W.K. Choi

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Structural And Electrical Properties ◽

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Transparent conducting indium zinc tin oxide thin films with low indium content deposited by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2014.02.016 ◽

2014 ◽

Vol 559 ◽

pp. 44-48 ◽

Author(s):

Maryane Putri ◽

Chang Young Koo ◽

Jung-A Lee ◽

Jeong-Joo Kim ◽

Hee Young Lee

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Indium Content ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Transparent Conducting ◽

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Structural and electrical properties of CuIn1−xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process

Applied Surface Science ◽

10.1016/j.apsusc.2014.11.131 ◽

2015 ◽

Vol 326 ◽

pp. 211-215 ◽

Author(s):

Jun Zhang ◽

Hongmei Deng ◽

Jun He ◽

Xiankuan Meng ◽

Tantan Liu ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties

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Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Applied Physics A ◽

10.1007/s003390000691 ◽

2001 ◽

Vol 73 (2) ◽

pp. 229-236 ◽

Author(s):

H.B. Nie ◽

S.Y. Xu ◽

S.J. Wang ◽

L.P. You ◽

Z. Yang ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Tantalum Nitride ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties

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Highly Transparent Conducting Indium Tin Oxide Thin Films Prepared by Radio Frequency Magnetron Sputtering and Thermal Annealing

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2019.16242 ◽

2019 ◽

Vol 19 (3) ◽

pp. 1455-1462 ◽

Author(s):

Bhaskar Parida ◽

Youngun Gil ◽

Hyunsoo Kim

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Thermal Annealing ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Transparent Conducting

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(400)-Oriented indium tin oxide thin films with high mobility and figure of merit prepared by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.137972 ◽

2020 ◽

Vol 704 ◽

pp. 137972 ◽

Author(s):

Ajinkya Bhorde ◽

Ashok Jadhavar ◽

Ravindra Waykar ◽

Shruthi Nair ◽

Haribhau Borate ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Figure Of Merit ◽

High Mobility ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films

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Preparation and characterization of transparent conductive zinc doped tin oxide thin films prepared by radio-frequency magnetron sputtering

Journal of Wuhan University of Technology-Mater Sci Ed ◽

10.1007/s11595-011-0235-z ◽

2011 ◽

Vol 26 (3) ◽

pp. 388-392 ◽

Author(s):

Jiang Zhao ◽

Jiamiao Ni ◽

Xiujian Zhao ◽

Yuli Xiong

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films

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Fabrication of Mg3Sb2 thin films via radio-frequency magnetron sputtering and analysis of the corresponding electrical properties

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-021-06468-3 ◽

2021 ◽

Author(s):

Jun-ichi Tani ◽

Hiromichi Ishikawa

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Electrical properties of plasma display panel with Mg1−xZnxO protecting thin films deposited by a radio frequency magnetron sputtering method

Applied Physics Letters ◽

10.1063/1.1899238 ◽

2005 ◽

Vol 86 (15) ◽

pp. 153503 ◽

Author(s):

E. Y. Jung ◽

S. G. Lee ◽

S. H. Sohn ◽

D. K. Lee ◽

H. K. Kim

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Plasma Display Panel ◽

Radio Frequency Magnetron Sputtering ◽

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The effects of thermal annealing on the structural and electrical properties of zinc tin oxide thin films for transparent conducting electrode applications

Physica B Condensed Matter ◽

10.1016/j.physb.2019.01.016 ◽

2019 ◽

Vol 558 ◽

pp. 5-9 ◽

Author(s):

Nitin Kumar ◽

Bhawana Joshi ◽

K. Asokan

Keyword(s):

Electrical Properties ◽

Thermal Annealing ◽

Tin Oxide ◽

Oxide Thin Films ◽

Transparent Conducting Electrode ◽

Transparent Conducting ◽

Conducting Electrode ◽

Structural And Electrical Properties ◽

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Characterization of (Pb1-xLax)TiO3 thin films grown by radio-frequency magnetron sputtering and their electrical properties

Integrated Ferroelectrics ◽

10.1080/10584589508012264 ◽

1995 ◽

Vol 10 (1-4) ◽

pp. 63-72 ◽

Author(s):

Su-Jin Chae ◽

Sang-Shik Park ◽

Soon-Gil Yoon ◽

Won-Jae Lee ◽

Ho-Gi Kim

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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