Plasma-enhanced growth of copper oxide nanostructures is widely explored in science and manufacturing, since it provides the flexibility, productivity, and cost-effectiveness necessary to meet the growing demands of customers. However, in the field of growth of metal oxide nanostructures, thermal methods still prevail in plasma methods in spite of long production time up to ten hours. Radiofrequency and microwave plasma sources were applied to grow CuO nanostructures, which are of high interest in various branches of industry, and allowed obtaining a large variety of the nanostructures, and nanowires in particular. At that, high price of the equipment limits the implementation of the results and urges to find cheaper plasma-enhanced method of growth. For this purpose, a common glow discharge plasma setup was engaged to grow the nanostructures in an oxygen atmosphere on surfaces of samples installed on the anode of the electric circuit designed to sustain the glow discharge. An additional heater was mounted under the anode. The proposed combination allowed conducting the growth process under conditions of the delivery of the necessary heat flux and removal the excessive ion flux that can destroy the growing nanostructures because of sputtering. In the first set of experiments, the additional heater was not used, and the observed nanostructures were presented by grains (2D) of about 370 nm in diameter and 80 nm in thickness. This structure is supposedly formed because of action of the internal stresses in the oxide layer. After turning on the heater, the nanowires (1D) were the only nanostructures observed in the experiment, and since no nanowires were found in a case of heating the anode without plasma ignition, one can consider the plasma as a factor determining the nanowire growth.
Plasma-enhanced thermal growth of copper oxide nanostructures on anode of glow discharge setup
