Complex study of protective Cr3C2–NiAl coatings deposited by vacuum electro-spark alloying, pulsed cathodic arc evaporation, magnetron sputtering, and hybrid technology

2021 ◽  
Author(s):  
Ph.V. Kiryukhantsev-Korneev ◽  
A.D. Sytchenko ◽  
V.A. Gorshkov ◽  
P.A. Loginov ◽  
A.N. Sheveyko ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Hybrid Technology ◽  
Complex Study ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

Hybrid technology combining electrospark alloying, cathodic arc evaporation and magnetron sputtering for hard wear-resistant coating deposition

2018 ◽  
pp. 92-103 ◽  
Author(s):  
A. N. Sheveyko ◽  
K. A. Kuptsov ◽  
Ph. V. Kiryukhantsev-Korneev ◽  
E. A. Levashov ◽  
D. V. Shtansky
Keyword(s):  
Magnetron Sputtering ◽  
Multilayer Coating ◽  
The Novel ◽  
Coating Deposition ◽  
Novel Technology ◽  
Porous Graphite ◽  
Cathodic Arc Evaporation ◽  
Mechanical And Tribological Characteristics ◽  
Arc Evaporation ◽  
Cathodic Arc

The novel technology of multilayer coating deposition combining electric-spark alloying (ESA), pulsed arc evaporation (PAE), and magnetron sputtering (MS) in one vacuum process is presented. Layers can be deposited using a single electrode material at operating pressures from 0,1 Pa to atmospheric pressure. The lower ESA layer provides increased substrate toughness, perfect adhesion and a relatively high (up to 100 μm) coating thickness. The upper PAE or MS layer up to 10 μm in thickness provides high mechanical and tribological characteristics. The technology of double-layer PAE–ESA and MS–ESA coating deposition was tested on substrates made of structural and tool steels, titanium alloys using electrodes of cemented carbides (WC–Co, TiCNiAl) and carbon (low-porous graphite).

scholarly journals Wetting properties of titanium oxides, oxynitrides and nitrides obtained by DC and pulsed magnetron sputtering and cathodic arc evaporation

2019 ◽  
Vol 37 (2) ◽  
pp. 173-181 ◽  
Author(s):  
Božana Čolović ◽  
Danilo Kisić ◽  
Bojan Jokanović ◽  
Zlatko Rakočević ◽  
Ilija Nasov ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Oxygen Vacancies ◽  
Titanium Nitrides ◽  
Titanium Oxides ◽  
High Concentration ◽  
Wetting Properties ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc ◽  
Pulsed Magnetron

AbstractThin films of titanium oxides, titanium oxynitrides and titanium nitrides were deposited on glass substrates by the methods of direct current (DC) and pulsed magnetron sputtering and cathodic arc evaporation. Phase analysis of the deposited films by X-ray diffraction (XRD) and Fourier-transform infrared spectroscopy (FT-IR) showed the presence of phases with various Ti oxidative states, which indicated a high concentration of oxygen vacancies. The films morphology was investigated by scanning electron microscopy (SEM). Investigations of the films wettability, either with water or ethylene glycol, showed that it depends directly on the concentration of oxygen vacancies. The wettability mechanism was particularly discussed.

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