Structure and properties of Ti films deposited by dc magnetron sputtering, pulsed dc magnetron sputtering and cathodic arc evaporation

2016 ◽  
Vol 304 ◽  
pp. 51-56 ◽  
Author(s):  
Chao Yang ◽  
Bailing Jiang ◽  
Zheng Liu ◽  
Juan Hao ◽  
Lin Feng
Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang

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