Structure and properties of Ti films deposited by dc magnetron sputtering, pulsed dc magnetron sputtering and cathodic arc evaporation
2016 ◽
Vol 304
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pp. 51-56
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2014 ◽
Vol 301
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pp. 475-480
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2016 ◽
Vol 287
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pp. 44-54
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2013 ◽
Vol 216
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pp. 251-258
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Keyword(s):
2013 ◽
Vol 586
(1)
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pp. 168-178
2005 ◽
Vol 38
(11)
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pp. 1769-1780
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