Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells

CIRP Annals ◽  
2016 ◽  
Vol 65 (1) ◽  
pp. 515-518 ◽  
Author(s):  
Suk Won Cha ◽  
Gu Young Cho ◽  
Yeageun Lee ◽  
Taehyun Park ◽  
Yusung Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Zro2 Thin Film ◽  
Layer Deposition ◽  
Thin Film Electrolyte ◽  
Film Electrolyte

Sintering-resistant platinum electrode achieved through atomic layer deposition for thin-film solid oxide fuel cells

2020 ◽  
Vol 835 ◽  
pp. 155347 ◽  
Author(s):  
Han Gil Seo ◽  
Sanghoon Ji ◽  
Jongsu Seo ◽  
Sanwi Kim ◽  
Bonjae Koo ◽  
...  
Keyword(s):  
Thin Film ◽  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Platinum Electrode ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Layer Deposition

Behavior of La0.6sr 0.4Co0.2Fe0.2O3-  Cathode Powders Surface Modified by Atomic Layer Deposition for Solid Oxide Fuel Cells

2016 ◽  
Vol 75 (6) ◽  
pp. 195-202 ◽  
Author(s):  
J. F. Roeder ◽  
A. F. Zeberoff ◽  
P. C. Van Buskirk ◽  
A. Torabi ◽  
J. Barton ◽  
...  
Keyword(s):  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Layer Deposition ◽  
Surface Modified

Tunability of Atomic Layer Deposition of Yttria-Stabilized Zirconium Oxide for use in Solid Oxide Fuel Cells

2013 ◽  
Vol 6 (1) ◽  
Author(s):  
A. Walter ◽  
R. Xu ◽  
G. Jursich ◽  
C.G. Takoudis
Keyword(s):  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Photoelectron Spectroscopy ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Spectral Ellipsometry ◽  
Layer Deposition

Thin films of yttria-stabilized zirconium oxide (YSZ) were successfully deposited using atomic layer deposition (ALD) for use in solid oxide fuel cells (SOFCs). YSZ was deposited on p-Si(100) by ALD using Tris(isopropyl-cyclopentadienyl)yttrium [(iPrCp)3Y] and tris(dimethylamino)cyclopentadienylzirconim [ZyALD] as metal precursors and ozone as oxidant. The normalized ALD cycle ratio of yttria cycles / total cycles used in making these films was varied to investigate the tunability of this process. Spectral ellipsometry was used to measure the thickness of the films. X-ray photoelectron spectroscopy (XPS) analyses were used to evaluate the composition and binding environments of as-deposited YSZ films. The normalized cycle ratio and the yttrium atomic percentage (Y atoms / metal atoms) have a linear relationship with a strong correlation, implying excellent tunability for this process. The binding environment analyses determine the oxidation state of the metals and show that decreasing the cycle ratio decreases the extent of yttrium hydroxidation.

Sign in / Sign up

Export Citation Format

Share Document