Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells

2016 ◽  
Vol 34 (1) ◽  
pp. 01A151 ◽  
Author(s):  
Gu Young Cho ◽  
Seungtak Noh ◽  
Yoon Ho Lee ◽  
Sanghoon Ji ◽  
Soon Wook Hong ◽  
...  
2020 ◽  
Vol 835 ◽  
pp. 155347 ◽  
Author(s):  
Han Gil Seo ◽  
Sanghoon Ji ◽  
Jongsu Seo ◽  
Sanwi Kim ◽  
Bonjae Koo ◽  
...  

2016 ◽  
Vol 75 (6) ◽  
pp. 195-202 ◽  
Author(s):  
J. F. Roeder ◽  
A. F. Zeberoff ◽  
P. C. Van Buskirk ◽  
A. Torabi ◽  
J. Barton ◽  
...  

Author(s):  
A. Walter ◽  
R. Xu ◽  
G. Jursich ◽  
C.G. Takoudis

Thin films of yttria-stabilized zirconium oxide (YSZ) were successfully deposited using atomic layer deposition (ALD) for use in solid oxide fuel cells (SOFCs). YSZ was deposited on p-Si(100) by ALD using Tris(isopropyl-cyclopentadienyl)yttrium [(iPrCp)3Y] and tris(dimethylamino)cyclopentadienylzirconim [ZyALD] as metal precursors and ozone as oxidant. The normalized ALD cycle ratio of yttria cycles / total cycles used in making these films was varied to investigate the tunability of this process. Spectral ellipsometry was used to measure the thickness of the films. X-ray photoelectron spectroscopy (XPS) analyses were used to evaluate the composition and binding environments of as-deposited YSZ films. The normalized cycle ratio and the yttrium atomic percentage (Y atoms / metal atoms) have a linear relationship with a strong correlation, implying excellent tunability for this process. The binding environment analyses determine the oxidation state of the metals and show that decreasing the cycle ratio decreases the extent of yttrium hydroxidation.


2011 ◽  
Vol 21 (29) ◽  
pp. 10903 ◽  
Author(s):  
Zeng Fan ◽  
Cheng-Chieh Chao ◽  
Faraz Hossein-Babaei ◽  
Fritz B. Prinz

Sign in / Sign up

Export Citation Format

Share Document