In situ high spatial resolution 87 Sr/ 86 Sr ratio determination of two Middle Pleistocene (c.a. 580 ka) Stephanorhinus hundsheimensis teeth by LA–MC–ICP–MS

2017 ◽  
Vol 412 ◽  
pp. 38-48 ◽  
Author(s):  
Federico Lugli ◽  
Anna Cipriani ◽  
Carlo Peretto ◽  
Maurizio Mazzucchelli ◽  
Daniele Brunelli
Keyword(s):  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Middle Pleistocene ◽  
Icp Ms ◽  
Ratio Determination

High spatial resolution in situ U–Pb dating using laser ablation multiple ion counting inductively coupled plasma mass spectrometry (LA-MIC-ICP-MS)

2017 ◽  
Vol 32 (5) ◽  
pp. 975-986 ◽  
Author(s):  
Lie-Wen Xie ◽  
Jin-Hui Yang ◽  
Qing-Zhu Yin ◽  
Yue-Heng Yang ◽  
Jing-Bo Liu ◽  
...  
Keyword(s):  
Spatial Resolution ◽  
Inductively Coupled Plasma ◽  
High Spatial Resolution ◽  
Zircon Age ◽  
Analytical Technique ◽  
Inductively Coupled ◽  
Rapid Measurement ◽  
Icp Ms ◽  
Plasma Mass Spectrometry

A new LA-MIC-ICP-MS analytical technique has been developed for the rapid measurement of 206Pb/238U zircon age (<1%, 2s) at a high spatial resolution. We show that this technique can be routinely employed to date U–Pb in small and/or complex zircons, providing a powerful tool for geochronology.

scholarly journals In-situ determination of antimony isotope ratios in Sb minerals by femtosecond LA-MC-ICP-MS

2021 ◽  
Author(s):  
Andreas Benjamin Kaufmann ◽  
Marina Lazarov ◽  
Stefan Kiefer ◽  
Juraj Majzlan ◽  
Stefan Weyer
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Femtosecond Laser Ablation ◽  
Isotope Ratios ◽  
Icp Ms

Here we present a method for in-situ determination of stable antimony (Sb) isotope compositions by ultraviolet (UV)-femtosecond-laser-ablation-multi-collector-ICP-MS (fs-LA-MC-ICP-MS). Metallic antimony and a number of Sb minerals (stibnite, senarmontite, chalcostibite, tetrahedrite,...

Characterization and Control of Copper CMP with Optoacoustic Metrology

2001 ◽  
Vol 671 ◽  
Author(s):  
Michael Gostein ◽  
Paul Lefevre ◽  
Alex A. Maznev ◽  
Michael Joffe
Keyword(s):  
Film Thickness ◽  
Spatial Resolution ◽  
Chemical Mechanical Polishing ◽  
High Spatial Resolution ◽  
Mechanical Polishing ◽  
Length Measurement ◽  
And Control ◽  
Non Destructive

ABSTRACTWe discuss applications of optoacoustic film thickness metrology for characterization of copper chemical-mechanical polishing (CMP). We highlight areas where the use of optoacoustics for CMP characterization provides data complementary to that obtained by other techniques because of its ability to directly measure film thickness with high spatial resolution in a rapid, non-destructive manner. Examples considered include determination of planarization length, measurement of film thickness at intermediate stages of polish, and measurement of arrays of metal lines.

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