Preparation of high-damage threshold WS2 modulator and its application for generating high-power large-energy bright-dark solitons

2020 ◽  
Vol 105 ◽  
pp. 103257 ◽  
Author(s):  
Pengfei Ma ◽  
Junshen Li ◽  
Huanian Zhang ◽  
Zhongmin Yang
2019 ◽  
Vol 11 (5) ◽  
pp. 1-12
Author(s):  
Pengfei Ma ◽  
Wei Lin ◽  
Huanian Zhang ◽  
Shanhui Xu ◽  
Zhongmin Yang

Nanomaterials ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 1305
Author(s):  
Pengfei Ma ◽  
Wei Lin ◽  
Huanian Zhang ◽  
Shanhui Xu ◽  
Zhongmin Yang

In our work, based on a high-damage-threshold MoS2 saturable absorber (SA), high-power intra-cavity Raman solitons within a passively mode-locked Yb-doped fiber laser were demonstrated successfully for the first time. The damage threshold of the MoS2 SA was as high as ~0.48 J/cm2. By adjusting the polarization states, stable single- or dual-pulse Raman soliton operations were obtained. The maximum average output power for single-pulse and dual-pulse Raman soliton operations was 80.11 and 89.33 mW, respectively. Our experiment results show significant enhancement in comparison with previous works, which provides fundamental guidance for future designs of high-power, large-energy, intra-cavity Raman soliton generations based on two-dimensional materials as SAs.


2018 ◽  
Vol 7 (1-2) ◽  
pp. 23-31 ◽  
Author(s):  
Hao Liu ◽  
Lars Jensen ◽  
Ping Ma ◽  
Detlev Ristau

AbstractAtomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3and HfO2single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.


2019 ◽  
Vol 31 (5) ◽  
pp. 381-384 ◽  
Author(s):  
Zhiyuan Dou ◽  
Bin Zhang ◽  
Xuan He ◽  
Zehua Xu ◽  
Jing Hou

2020 ◽  
Vol 3 (1) ◽  
Author(s):  
Yurina Michine ◽  
Hitoki Yoneda

2011 ◽  
Author(s):  
Zhen-yu Zhao ◽  
Jin-song Nie
Keyword(s):  

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