Atomic layer deposition of Al2O3 and HfO2 for high power laser application

2020 ◽  
pp. 157751
Author(s):  
Hao Liu ◽  
Ping Ma ◽  
Yunti Pu ◽  
Zuzhen Zhao
Keyword(s):  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Laser Application ◽  
High Power Laser ◽  
Power Laser ◽  
Layer Deposition

scholarly journals Bottom-Up Fabrication of Oxygen Reduction Electrodes with Atomic Layer Deposition for High-Power-Density PEMFCs

2021 ◽  
Vol 2 (1) ◽  
pp. 100297
Author(s):  
Samuel M. Dull ◽  
Shicheng Xu ◽  
Timothy Goh ◽  
Dong Un Lee ◽  
Drew Higgins ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Reduction ◽  
Power Density ◽  
High Power ◽  
Atomic Layer ◽  
High Power Density ◽  
Bottom Up ◽  
Layer Deposition

scholarly journals High power nano-structured V2O5 thin film cathodes by atomic layer deposition

2014 ◽  
Vol 2 (36) ◽  
pp. 15044-15051 ◽  
Author(s):  
Erik Østreng ◽  
Knut Bjarne Gandrud ◽  
Yang Hu ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Li Ion Batteries ◽  
Layer Deposition ◽  
Li Ion

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C.

ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application

2018 ◽  
Vol 7 (1-2) ◽  
pp. 23-31 ◽  
Author(s):  
Hao Liu ◽  
Lars Jensen ◽  
Ping Ma ◽  
Detlev Ristau
Keyword(s):  
High Power ◽  
High Surface ◽  
Laser System ◽  
Damage Threshold ◽  
Atomic Layer ◽  
Intensity Difference ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Applications ◽  
Laser Induced Damage

AbstractAtomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3and HfO2single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.

High Power Laser Application in Openhole Multiple Fracturing with an Overview of Laser Research; Past, Present and Future

2012 ◽  
Author(s):  
Sameeh I. Batarseh ◽  
Hazim H. Abass ◽  
Abdulrahman A. Al-Mulhem ◽  
Nabeel S. Habib
Keyword(s):  
High Power ◽  
Laser Application ◽  
High Power Laser ◽  
Power Laser

Development of longer Nd:LGGG crystal for high power laser application

2017 ◽  
Vol 478 ◽  
pp. 28-32 ◽  
Author(s):  
Yanru Yin ◽  
Hanlin Tian ◽  
Jian Zhang ◽  
Wenxiang Mu ◽  
Baitao Zhang ◽  
...  
Keyword(s):  
High Power ◽  
Laser Application ◽  
High Power Laser ◽  
Power Laser

scholarly journals The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology

Nanomaterials ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 3282
Author(s):  
Guibai Xie ◽  
Hongwu Bai ◽  
Guanghui Miao ◽  
Guobao Feng ◽  
Jing Yang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Power ◽  
Manufacturing Industry ◽  
Secondary Electron ◽  
Atomic Layer ◽  
Manufacturing Technology ◽  
Advanced Manufacturing Technology ◽  
Advanced Manufacturing ◽  
Aerospace Manufacturing ◽  
Layer Deposition

With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry. In this paper, we report the applications of ultra-thin atomic layer deposition nanofilm in the advanced aerospace manufacturing industry, including aluminum anti-oxidation and secondary electron suppression, which are critical in high-power and miniaturization development. The compact and uniform aluminum oxide film, which is formed by thermal atomic layer deposition (ALD), can prevent the deep surface oxidation of aluminum during storage, avoiding the waste of material and energy in repetitive production. The total secondary electron yield of the C/TiN component nanofilm, deposited through plasma-enhanced atomic layer deposition, decreases 25% compared with an uncoated surface. The suppression of secondary electron emission is of great importance in solving the multipactor for high-power microwave components in space. Moreover, the controllable, ultra-thin uniform composite nanofilm can be deposited directly on the complex surface of devices without any transfer process, which is critical for many different applications. The ALD nanofilm shows potential for promoting system performance and resource consumption in the advanced aerospace manufacturing industry.

Research and development of neodymium phosphate laser glass for high power laser application

2017 ◽  
Vol 63 ◽  
pp. 213-220 ◽  
Author(s):  
Lili Hu ◽  
Dongbing He ◽  
Huiyu Chen ◽  
Xin Wang ◽  
Tao Meng ◽  
...  
Keyword(s):  
Research And Development ◽  
High Power ◽  
Laser Application ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Glass
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