Optical coatings grown by atomic layer deposition for high-power laser applications

2003 ◽  
Vol 52 (3) ◽  
pp. 321
Author(s):  
T Jitsuno ◽  
S Motokoshi ◽  
M Nakatsuka ◽  
T Yamanaka ◽  
S-i Zaitsu
Keyword(s):  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Optical Coatings ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Applications ◽  
Layer Deposition

ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application

2018 ◽  
Vol 7 (1-2) ◽  
pp. 23-31 ◽  
Author(s):  
Hao Liu ◽  
Lars Jensen ◽  
Ping Ma ◽  
Detlev Ristau
Keyword(s):  
High Power ◽  
High Surface ◽  
Laser System ◽  
Damage Threshold ◽  
Atomic Layer ◽  
Intensity Difference ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Applications ◽  
Laser Induced Damage

AbstractAtomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3and HfO2single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.

Large-Area Optical Coatings with Uniform Thickness Grown by Surface Chemical Reactions for High-Power Laser Applications

2002 ◽  
Vol 41 (Part 1, No. 1) ◽  
pp. 160-165 ◽  
Author(s):  
Shin-ichi Zaitsu ◽  
Shinji Motokoshi ◽  
Takahisa Jitsuno ◽  
Masahiro Nakatsuka ◽  
Tatsuhiko Yamanaka
Keyword(s):  
Chemical Reactions ◽  
High Power ◽  
Optical Coatings ◽  
Surface Chemical ◽  
Uniform Thickness ◽  
High Power Laser ◽  
Large Area ◽  
Power Laser ◽  
Laser Applications ◽  
Surface Chemical Reactions

Analysis of thermal stresses in HfO2/SiO2high reflective optical coatings for high power laser applications

2015 ◽  
Author(s):  
Chunxue Gao ◽  
Zhiwei Zhao ◽  
Zhuoya Zhu ◽  
Shuang Li ◽  
Changwen Mi
Keyword(s):  
High Power ◽  
Thermal Stresses ◽  
Optical Coatings ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Applications

scholarly journals Bottom-Up Fabrication of Oxygen Reduction Electrodes with Atomic Layer Deposition for High-Power-Density PEMFCs

2021 ◽  
Vol 2 (1) ◽  
pp. 100297
Author(s):  
Samuel M. Dull ◽  
Shicheng Xu ◽  
Timothy Goh ◽  
Dong Un Lee ◽  
Drew Higgins ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Reduction ◽  
Power Density ◽  
High Power ◽  
Atomic Layer ◽  
High Power Density ◽  
Bottom Up ◽  
Layer Deposition

scholarly journals High power nano-structured V2O5 thin film cathodes by atomic layer deposition

2014 ◽  
Vol 2 (36) ◽  
pp. 15044-15051 ◽  
Author(s):  
Erik Østreng ◽  
Knut Bjarne Gandrud ◽  
Yang Hu ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Li Ion Batteries ◽  
Layer Deposition ◽  
Li Ion

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C.

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