Low-temperature Si epitaxy on large-grained polycrystalline seed layers by electron–cyclotron resonance chemical vapor deposition
2004 ◽
Vol 270
(3-4)
◽
pp. 396-401
◽
1997 ◽
Vol 36
(Part 1, No. 11)
◽
pp. 6909-6914
◽
1983 ◽
Vol 22
(Part 2, No. 4)
◽
pp. L210-L212
◽
2014 ◽
Vol 2014
◽
pp. 1-8
◽
1997 ◽
Vol 36
(Part 2, No. 7B)
◽
pp. L936-L938
2001 ◽
Vol 10
(11)
◽
pp. 2075-2083
◽
2001 ◽