SiGe high-temperature growth kinetics in reduced pressure-chemical vapor deposition

2005 ◽  
Vol 274 (1-2) ◽  
pp. 28-37 ◽  
Author(s):  
Y. Bogumilowicz ◽  
J.M. Hartmann ◽  
G. Rolland ◽  
T. Billon
Keyword(s):  
Chemical Vapor Deposition ◽  
High Temperature ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Reduced Pressure ◽  
Temperature Growth ◽  
Pressure Chemical

Effect of HCl on the SiGe growth kinetics in reduced pressure—chemical vapor deposition

2002 ◽  
Vol 241 (1-2) ◽  
pp. 93-100 ◽  
Author(s):  
J.M. Hartmann ◽  
F. Champay ◽  
V. Loup ◽  
G. Rolland ◽  
M.N. Séméria
Keyword(s):  
Chemical Vapor Deposition ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Reduced Pressure ◽  
Pressure Chemical

SiGe growth kinetics and doping in reduced pressure-chemical vapor deposition

2002 ◽  
Vol 236 (1-3) ◽  
pp. 10-20 ◽  
Author(s):  
J.M Hartmann ◽  
V Loup ◽  
G Rolland ◽  
P Holliger ◽  
F Laugier ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Reduced Pressure ◽  
Pressure Chemical

scholarly journals Ge / SiGe Multi Quantum Well Fabrication by Using Reduced Pressure Chemical Vapor Deposition

2019 ◽  
Author(s):  
Y. Yamamoto ◽  
O. Skibitzki ◽  
M.A. Schubert ◽  
M. Scuderi ◽  
F. Reichmann ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Quantum Well ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Reduced Pressure ◽  
Pressure Chemical ◽  
Multi Quantum Well

Ge/SiGe multiple quantum well fabrication by reduced-pressure chemical vapor deposition

2020 ◽  
Vol 59 (SG) ◽  
pp. SGGK10
Author(s):  
Yuji Yamamoto ◽  
Oliver Skibitzki ◽  
Markus Andreas Schubert ◽  
Mario Scuderi ◽  
Felix Reichmann ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Quantum Well ◽  
Vapor Deposition ◽  
Multiple Quantum Well ◽  
Chemical Vapor ◽  
Multiple Quantum ◽  
Reduced Pressure ◽  
Pressure Chemical

High temperature and low pressure chemical vapor deposition of silicon nitride on AlGaN: Band offsets and passivation studies

2016 ◽  
Vol 119 (14) ◽  
pp. 145702 ◽  
Author(s):  
Pramod Reddy ◽  
Shun Washiyama ◽  
Felix Kaess ◽  
M. Hayden Breckenridge ◽  
Luis H. Hernandez-Balderrama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
High Temperature ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Band Offsets ◽  
Pressure Chemical
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