scholarly journals Impurity removal from Si by Si-Ca-Mg ternary alloying-leaching system

2021 ◽  
Vol 198 ◽  
pp. 109348
Author(s):  
Mengyi Zhu ◽  
Di Wan ◽  
Kai Tang ◽  
Jafar Safarian
2015 ◽  
pp. 375-378
Author(s):  
Ahmed S. Vawda ◽  
Emmanuel M. Sarir ◽  
Carlos Andrés Donado

Impurity removal by separation and crystallisation are the most important process operations in a refinery. This paper studies the main separation processes, namely clarification, decolourisation and crystallisation to demonstrate where poor separation contributes to excessive costs of processing. The results of various tests are analysed and conclusions are made for refiners to manage their chemical and fuel costs.


2016 ◽  
Author(s):  
David W. James ◽  
Gregg A. Morgan, Jr.
Keyword(s):  

2015 ◽  
Vol 151 ◽  
pp. 251-255 ◽  
Author(s):  
Pengfei Xing ◽  
Jingqiang Wang ◽  
Tian Lyu ◽  
Yanxin Zhuang ◽  
Xinghong Du ◽  
...  

Author(s):  
Zhuang Li ◽  
Yijun Cao ◽  
Guihong Han ◽  
Guixia Fan ◽  
Yanfang Huang
Keyword(s):  

2021 ◽  
Vol 119 (1) ◽  
pp. 101
Author(s):  
Yaqiong Li ◽  
Yunlong Yu ◽  
Lifeng Zhang ◽  
Zhengtao Li

The interfacial reactions between impurities (Al and Ti) and slag onset of Si purification by 51 mol% SiO2–34 mol% CaO–15 mol% MgO slag addition were studied to enhance impurity removal efficiency from Si. The Al distribution behavior at the Si/Slag interface was investigated; a short reaction time (10 s) resulted in the formation of successive SiO2–CaO–MgO–Al2O3 layers in the slag with a thickness of 10 µm; increasing the reaction time (60 s) resulted in the entire ternary slag being changed into SiO2–CaO–MgO–Al2O3 quaternary slag due to the diffusion of Al2O3. It was shown that the highest impurity removal rate of Al could be achieved at the onset of the slag refining process. Based on the Ti distribution at the Si/slag interface, the slag refinement with 51 mol% SiO2–34 mol% CaO–15 mol% MgO had no effect on Ti removal.


2019 ◽  
Vol 27 ◽  
pp. 236-245 ◽  
Author(s):  
Jun Wang ◽  
Zengxi Pan ◽  
Liangliang Wei ◽  
Shuai He ◽  
Dominic Cuiuri ◽  
...  

JOM ◽  
2020 ◽  
Vol 72 (7) ◽  
pp. 2648-2655 ◽  
Author(s):  
Yunyang Zhu ◽  
Jijun Wu ◽  
Qiliang Wang ◽  
Wenhui Ma ◽  
Kuixian Wei ◽  
...  

2019 ◽  
Vol 60 (5) ◽  
pp. 463-472
Author(s):  
Aisan Ramadi ◽  
Mohammad Noaparast ◽  
Seyed Ziaedin Shafaie ◽  
Armin Salsani

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