Synthesis of lead oxide thin films by using physical vapor deposition technique

2021 ◽  
Vol 42 ◽  
pp. 2752-2755
Author(s):  
Ahmed F. Abdulrahman ◽  
Raghad Y. Mohammed ◽  
Sabah M. Ahmed ◽  
Samir M. Hamad
Keyword(s):  
Thin Films ◽  
Vapor Deposition ◽  
Lead Oxide ◽  
Physical Vapor Deposition ◽  
Deposition Technique ◽  
Oxide Thin Films ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique

Low Temperature Laser Physical Vapor Deposition of Multilayered Thin Films

1989 ◽  
Vol 158 ◽  
Author(s):  
N. Biunno ◽  
J. Krishnaswamy ◽  
S. Sharan ◽  
L. Ganapathi ◽  
J. Narayan
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Layer By Layer ◽  
Deposition Technique ◽  
Target Holder ◽  
Multi Stage ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique

ABSTRACTWe have investigated the formation of various multilayer thin films by the laser physical vapor deposition technique. A multi stage target holder was constructed to perform all process steps in-situ; target/substrate cleaning, deposition, and annealing. The laser physical vapor deposition technique offers many advantages over conventional physical vapor techniques, such as, lower substrate temperature, microstructural control, and very low contamination levels. Film thickness can be controlled from near atomic to micron dimensions. A layer-by-layer (two dimensional) growth can be achieved, resulting in nonequilibrium structures. The films were analyzed using cross-section and high resolution transmission electron microscopy (TEM). The significant reduction in substrate temperature for the formation of high quality multilayer and epitaxial films opens up many new areas of applications requiring reduced thermal-budget processing.

Sign in / Sign up

Export Citation Format

Share Document