Sputtering onto liquids: a critical review

Sputter deposition of atoms onto liquid substrates aims at producing colloidal dispersions of small monodisperse ultrapure nanoparticles (NPs). Since sputtering onto liquids combines the advantages of the physical vapor deposition technique and classical colloidal synthesis, the review contains chapters explaining the basics of (magnetron) sputter deposition and the formation of NPs in solution. This review article covers more than 132 papers published on this topic from 1996 to September 2021 and aims at providing a critical analysis of most of the reported data; we will address the influence of the sputtering parameters (sputter power, current, voltage, sputter time, working gas pressure, and the type of sputtering plasma) and host liquid properties (composition, temperature, viscosity, and surface tension) on the NP formation as well as a detailed overview of the properties and applications of the produced NPs.

Physical Vapor-Deposited Silver (Ag)-Based Metal-Dielectric Nanocomposites for Thin-Film and Coating Applications

Metallic thin-film materials and nanoparticles (mainly silver (Ag)-based) are recently being used in many nano-technological applications, including sensors, reflective heat-mirror coatings, and antibacterial coatings. The physical vapor deposition technique has attracted significant attention for Ag-based nanocomposites with tailoring of the structural and optical properties of metallic thin films, thus allowing for further improvements and application possibilities in various existing fields, namely electronics, catalysis, magnetics, and optics, alongside the environment and health and new emergent fields, particularly thin-film coatings. This study highlights the preparation, characterization, properties, and possible future application directions of several types of silver (Ag)-based nanocomposite thin films prepared by using physical vapor deposition techniques. The high-temperature (above 300 °C) heat-treated composite layer shows significant spectral shifts; however, distinguishingly notable sizes of nanoparticles are not observed, which indicates that this newly developed composite material can be useful for various coating applications.

Physical Vapor Deposited Silver (AG) Based Metal-Dielectric Nanocomposites for Advanced Thin-Film and Coating Applications

Metallic thin-film materials and nanoparticles (mainly Silver (Ag)-based) are recently being used in many nano-technological applications including sensors, reflective heat-mirror coatings, and antibacterial coatings as well. The physical vapor deposition technique attracts significant attention for Ag-based nanocomposites with tailoring the structural and optical properties of metallic thin films thus allowing further improvements and application possibilities in various existing fields namely electronics, catalysis, magnetics, optics in alongside the environment and health and new emergent fields in, particularly thin-film coatings. This study highlights the preparation, characterization, properties, and possible future application directions of several types of Silver (Ag)-based nanocomposite thin films prepared by using physical vapor deposition techniques.

A Combined Experimental and Tddft-dft Investigation of Structural and Optical Properties of Novel Pyrazole-1, 2, 3-triazole Hybrids as Optoelectronic Devices

A conjugated semiconductor thin film of 1-((3-(3-(3,5-diphenyl-4,5-dihydro-1H-pyrazol-1-yl)-5-methyl-1H-1,2,4-triazol-1-yl)-1-phenyl-1H-pyrazol-4-yl)methyl)-4-phenyl-1H-1,2,3-triazole [4ph-TAzole]TF was synthesized. The characterization of the obtained [4ph-TAzole]TF powder is carried out using different techniques includes FTIR, UV-Vis, 1HNMR, XRD, and mass spectra. The fabricated [4ph-TAzole]TF thin film with a thickness of 150 ± 3 nm is manufactured by physical vapor deposition technique (PVD) at a low deposition rate with basic pressure of the chamber was 5×10− 5 mbar. Using DFT-TDDFT simulation, the structure measurements can determine the energy gap and optical properties. The obtained DFT-TDDFT data provide good proof for the electronic transition in zero-dimensional [4ph-TAzole]TF as a single crystal molecule. This study provides valuable information on the nature and sources of defect formation and electronic transition in conductor organic derivate of triazole which open the way for the application as an optoelectronic device. Application Davis’s and Shilliday’s equation on [4ph-TAzole]TF mentioned that the \({\text{E}}_{\text{g}}^{\text{D}\text{i}\text{r}}\)and \({\text{E}}_{\text{g}}^{\text{I}\text{n}\text{d}}\)transitions can be computed by plotting \(({{\alpha }\text{h}{\nu })}^{2}\) and \(({{\alpha }\text{h}{\nu })}^{0.5}\) versus \(\text{h}{\nu }\) nearby the value of fundamental band edge (\(({{\alpha }\text{h}{\nu })}^{2}\) and \(({{\alpha }\text{h}{\nu })}^{0.5}\) parts) in the computed Abs. (λ) curves to zero absorption value, respectively. The direct and indirect energies were 2.651eV and 3.01 eV for [4ph-TAzole]TF, respectively. The obtained thin film presents a promising result to be a good candidate for organic derivate of triazole solar cell applications.

Features of optical properties of high stable CdTe photovoltaic absorber layer

In this paper, the technology of obtaining and effect of annealing on the morphology and optical properties of cadmium telluride thin films has been investigated. The effect of vacuum chamber modes on the growth of thin films has been studied. For obtained cadmium telluride thin films were used a modified thermal evaporation method deposited by Physical Vapor Deposition technique on a glass substrate with different thicknesses. The transmission measurements were carried with UV-ViS-NIR Spectrophotometer in the wavelength range 180-3300 nm, to analyze the optical properties as a function of wavelength. The optical band gap values were 1.49 eV for as-grown films and 1.46 eV after annealing. The refractive indexes of the samples were defined in the range of 2.6 – 2.8 for as-grown films and the indexes have increased after annealing depending on the wavelength region and film thickness. After annealing, the coalescence mode of growth is observed.