Different shapes of microstrip line design using FR4 substrate materials – A comprehensive review

Author(s):  
S. Harikirubha ◽  
V. Baranidharan ◽  
S. Saranya ◽  
K. Keerthana ◽  
M. Nandhini
Author(s):  
Benedict Scheiner ◽  
Christopher Beck ◽  
Fabian Lurz ◽  
Martin Frank ◽  
Fabian Michler ◽  
...  

2021 ◽  
Vol 11 (3) ◽  
pp. 915
Author(s):  
Hung Khac Le ◽  
SoYoung Kim

In this paper, we propose an efficient design methodology for energy-efficient off-chip interconnect. This approach leverages an artificial neural network (ANN) as a surrogate model that significantly improves design efficiency in the frequency-domain. This model utilizes design specifications as the constraint functions to guarantee the satisfaction of design requirements. Additionally, a specified objective function to select low-loss and low-noise structure is employed to determine the optimal case from a large design space. The proposed design flow can find the optimum design that gives maximum eye height (EH) with the largest allowable transmitter supply voltage (VTX) reduction for minimum power consumption. The proposed approach is applied to the microstrip line and stripline structures with single-ended and differential signals for general applicability. For the microstrip line, the proposed methodology performs at a performance speed with 42.7 and 0.5 s per structure for the data generation and optimization process, respectively. In addition, the optimal microstrip line design achieves a 25%VTX reduction. In stripline structures, it takes 31.9 s for the data generation and 0.6 s for the optimization process per structure when the power efficiency reaches a maximum 30.7% peak to peak VTX decrease.


Author(s):  
Jun Jiao

HREM studies of the carbonaceous material deposited on the cathode of a Huffman-Krätschmer arc reactor have shown a rich variety of multiple-walled nano-clusters of different shapes and forms. The preparation of the samples, as well as the variety of cluster shapes, including triangular, rhombohedral and pentagonal projections, are described elsewhere.The close registry imposed on the nanotubes, focuses attention on the cluster growth mechanism. The strict parallelism in the graphitic separation of the tube walls is maintained through changes of form and size, often leading to 180° turns, and accommodating neighboring clusters and defects. Iijima et. al. have proposed a growth scheme in terms of pentagonal and heptagonal defects and their combinations in a hexagonal graphitic matrix, the first bending the surface inward, and the second outward. We report here HREM observations that support Iijima’s suggestions, and add some new features that refine the interpretation of the growth mechanism. The structural elements of our observations are briefly summarized in the following four micrographs, taken in a Hitachi H-8100 TEM operating at an accelerating voltage of 200 kV and with a point-to-point resolution of 0.20 nm.


1991 ◽  
Vol 36 (6) ◽  
pp. 529-529
Author(s):  
Mary Catherine King
Keyword(s):  

2020 ◽  
Vol 56 (7) ◽  
pp. 1233-1251
Author(s):  
Lisa Jacquey ◽  
Jacqueline Fagard ◽  
Rana Esseily ◽  
J. Kevin O'Regan

2012 ◽  
Author(s):  
Andrew Frazer ◽  
Kelly S. Flanagan ◽  
Kendra B. Battaglia

2007 ◽  
Author(s):  
Steve A. Nida ◽  
Arona R. Muckenfuss ◽  
D. Michelle Turner ◽  
Kipling D. Williams

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