scholarly journals Comparative study of solution–phase and vapor–phase deposition of aminosilanes on silicon dioxide surfaces

2014 ◽  
Vol 35 ◽  
pp. 283-290 ◽  
Author(s):  
Amrita R. Yadav ◽  
Rashmi Sriram ◽  
Jared A. Carter ◽  
Benjamin L. Miller
Keyword(s):  
Comparative Study ◽  
Silicon Dioxide ◽  
Vapor Phase ◽  
Solution Phase ◽  
Vapor Phase Deposition

Surface Topography of Vinyltriethoxysilane Films Deposited on the Silicon Dioxide Substrate (0001) Investigated by Atomic Force Microscopy

2011 ◽  
Vol 418-420 ◽  
pp. 513-522
Author(s):  
Yun Wu ◽  
Chu Jiang Cai ◽  
Zhi Gang Shen ◽  
Shu Lin Ma ◽  
Yu Shan Xing
Keyword(s):  
Atomic Force Microscopy ◽  
Silicon Dioxide ◽  
Surface Topography ◽  
Vapor Phase ◽  
Solution Method ◽  
Water Contact ◽  
Force Microscopy ◽  
Vapor Phase Deposition ◽  
Atomic Force ◽  
Deposition Processes

The surface topography and growth behavior of self-assembled monolayers (SAMs) formed from vinyltriethoxysilane (VTES) at a constant temperature (20°C) on silicon dioxide substrates were investigated using atomic force microscopy (AFM). Two methods for silanization were introduced: vapor phase deposition and deposition from a solution. The influence of deposition conditions on the topography of silane films was also studied. The property of modified SiO2substrates surface was characterized by static water contact angle measurements. The experimental results revealed that the silane films deposited from the solution method grew via islands, whereas this is not the case for vapor phase deposition. The roughness of the layers deposited via solution method first decreased and then increased with the VTES concentration increasing, while the roughness of the layers deposited via vapor phase increased straight. Furthermore, the adsorption types for silane being adsorbed on SiO2substrates were also investigated. The results indicated that there were two adsorption types in both deposition processes: physisorption and chemisorption.

52.3: Invited Paper: OLED Manufacturing by Organic Vapor Phase Deposition

2003 ◽  
Vol 34 (1) ◽  
pp. 1419 ◽  
Author(s):  
Markus Schwambera ◽  
Nico Meyer ◽  
Markus Gersdorff ◽  
Markus Reinhold ◽  
Gerd Strauch ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Organic Vapor ◽  
Vapor Phase Deposition ◽  
Organic Vapor Phase Deposition

Organic vapor phase deposition for the growth of large area organic electronic devices

2009 ◽  
Vol 95 (23) ◽  
pp. 233305 ◽  
Author(s):  
Richard R. Lunt ◽  
Brian E. Lassiter ◽  
Jay B. Benziger ◽  
Stephen R. Forrest
Keyword(s):  
Vapor Phase ◽  
Electronic Devices ◽  
Large Area ◽  
Organic Electronic Devices ◽  
Organic Electronic ◽  
Organic Vapor ◽  
Vapor Phase Deposition ◽  
Organic Vapor Phase Deposition
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