Characterization of rare earth oxides based MOSFET gate stacks prepared by metal-organic chemical vapour deposition

Vapour Deposition ◽

Chemical Vapour ◽

Rare Earth Oxides ◽

Organic Chemical ◽

Gate Stacks ◽

Characterization of thin superconducting films prepared by metal-organic chemical vapour deposition

Materials Science and Engineering B ◽

10.1016/0921-5107(92)90326-5 ◽

1992 ◽

Vol 14 (1) ◽

pp. 43-45 ◽

Cited By ~ 2

Author(s):

K. Fröhlich ◽

J. Šouc ◽

D. Machajdík ◽

I. Vávra

Keyword(s):

Vapour Deposition ◽

Chemical Vapour ◽

Superconducting Films ◽

Organic Chemical ◽

Metal Organic ◽

Thin Superconducting Films

Infrared spectroscopic and X-ray diffraction characterization of iron disulphide thin films prepared by metal-organic chemical vapour deposition

Journal of Materials Science Letters ◽

10.1007/bf00730854 ◽

1992 ◽

Vol 11 (16) ◽

pp. 1131-1133 ◽

Cited By ~ 8

Author(s):

A. Ennaoui ◽

S. Schroetter ◽

S. Fiechter ◽

H. Tributsch

Keyword(s):

Thin Films ◽

Vapour Deposition ◽

Chemical Vapour ◽

Organic Chemical ◽

X Ray Diffraction ◽

X Ray ◽

Infrared Spectroscopic ◽

Growth and characterization of germanium epitaxial film on silicon (001) with germane precursor in metal organic chemical vapour deposition (MOCVD) chamber

AIP Advances ◽

10.1063/1.4822424 ◽

2013 ◽

Vol 3 (9) ◽

pp. 092123 ◽

Cited By ~ 37

Author(s):

Kwang Hong Lee ◽

Adam Jandl ◽

Yew Heng Tan ◽

Eugene A. Fitzgerald ◽

Chuan Seng Tan

Keyword(s):

Vapour Deposition ◽

Epitaxial Film ◽

Chemical Vapour ◽

Organic Chemical ◽

Characterization of ZnMgO hexagonal-nanotowers/films onm-plane sapphire synthesized by metal organic chemical vapour deposition

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/41/20/205416 ◽

2008 ◽

Vol 41 (20) ◽

pp. 205416 ◽

Cited By ~ 13

Author(s):

A L Yang ◽

H Y Wei ◽

X L Liu ◽

H P Song ◽

H B Fan ◽

...

Keyword(s):

Vapour Deposition ◽

Chemical Vapour ◽

Organic Chemical ◽

Structural and morphological characterization of the Cd-rich region in Cd1-xZnxO thin films grown by atmospheric pressure metal organic chemical vapour deposition

Thin Solid Films ◽

10.1016/j.tsf.2019.05.044 ◽

2019 ◽

Vol 683 ◽

pp. 128-134 ◽

Cited By ~ 2

Author(s):

Adelaida Huerta-Barberà ◽

Esther de Prado ◽

Maria del Carmen Martínez-Tomás ◽

Saïd Agouram ◽

Elias Muñoz ◽

...

Keyword(s):

Thin Films ◽

Atmospheric Pressure ◽

Vapour Deposition ◽

Chemical Vapour ◽

Morphological Characterization ◽

Organic Chemical ◽

Rich Region ◽

Characterization of ZnS grown by metal-organic chemical vapour deposition on GaAs(100) using t-butyl mercaptan and dimethylzinc

Advanced Materials for Optics and Electronics ◽

10.1002/amo.860010108 ◽

1992 ◽

Vol 1 (1) ◽

pp. 43-46 ◽

Cited By ~ 8

Author(s):

D. N. Armitage ◽

H. M. Yates ◽

J. O. Williams ◽

D. J. Cole-hamilton ◽

I. L. J. Patterson

Keyword(s):

Vapour Deposition ◽

Chemical Vapour ◽

Organic Chemical ◽

Synthesis and Characterization of Tantalum Oxide Deposited By Metal-Organic Chemical Vapour Deposition (MOCVD)

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/430/1/012049 ◽

2018 ◽

Vol 430 ◽

pp. 012049

Author(s):

S O Jeje ◽

O O Akinwunmi ◽

M B Shongwe

Keyword(s):

Vapour Deposition ◽

Tantalum Oxide ◽

Chemical Vapour ◽

Synthesis And Characterization ◽

Organic Chemical ◽

Characterization of high quality InGaP/GaAs and InGaAsP/GaAs heterostructures grown by low pressure metal-organic chemical vapour deposition

Materials Science and Engineering B ◽

10.1016/0921-5107(94)90038-8 ◽

1994 ◽

Vol 28 (1-3) ◽

pp. 158-163 ◽

Cited By ~ 3

Author(s):

M. Caldironi ◽

L. Vitali ◽

M. Dellagiovanna ◽

A. Di Paola ◽

F. Vidimari ◽

...

Keyword(s):

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Organic Chemical ◽

High Quality ◽

Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high resolution SEM, (AR)XPS and AES depth profiling

Fresenius Journal of Analytical Chemistry ◽

10.1007/bf00321355 ◽

1995 ◽

Vol 353 (5-8) ◽

pp. 707-712 ◽

Cited By ~ 4

Author(s):

W. Lisowski ◽

A. H. J. van den Berg ◽

M. Smithers ◽

V. A. C. Haanappel

Keyword(s):

High Resolution ◽

Vapour Deposition ◽

Chemical Vapour ◽

Depth Profiling ◽

Organic Chemical ◽

Alumina Films ◽

Growth study and characterization of In–Sb–Te compounds deposited onto different substrates by metal–organic chemical vapour deposition

Thin Solid Films ◽

10.1016/j.tsf.2012.10.107 ◽

2013 ◽

Vol 533 ◽

pp. 66-69 ◽

Cited By ~ 9

Author(s):

T. Stoycheva ◽

M. Longo ◽

R. Fallica ◽

F. Volpe ◽

C. Wiemer

Keyword(s):

Vapour Deposition ◽

Chemical Vapour ◽

Organic Chemical ◽

Growth Study ◽