Bifunctional metal phosphide FeMnP films from single source metal organic chemical vapor deposition for efficient overall water splitting

Nano Energy ◽

10.1016/j.nanoen.2017.07.027 ◽

2017 ◽

Vol 39 ◽

pp. 444-453 ◽

Author(s):

Zhenhuan Zhao ◽

Desmond E. Schipper ◽

Andrew P. Leitner ◽

Hari Thirumalai ◽

Jing-Han Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Water Splitting ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Metal Phosphide ◽

Overall Water Splitting ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal−Organic Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm9905040 ◽

1999 ◽

Vol 11 (12) ◽

pp. 3430-3432 ◽

Author(s):

Mike R. Lazell ◽

Paul O'Brien ◽

David J. Otway ◽

Jin-Ho Park

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gallium Sulfide ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition.

10.1002/chin.200443025 ◽

2004 ◽

Vol 35 (43) ◽

Author(s):

John Waters ◽

David Crouch ◽

James Raftery ◽

Paul O'Brien

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Chalcogenide Thin Films ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Metal-Organic Chemical Vapor Deposition of Semiconducting III/VI In2Se3 Thin Films from the Single-Source Precursor: In(SeC(SiMe3)3)3.

10.1002/chin.199612269 ◽

2010 ◽

Vol 27 (12) ◽

pp. no-no

Author(s):

J. CHEON ◽

J. ARNOLD ◽

K.-M. YU ◽

E. D. BOURRET

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal-Organic Chemical Vapor Deposition.

10.1002/chin.200011022 ◽

2010 ◽

Vol 31 (11) ◽

pp. no-no

Author(s):

Mike R. Lazell ◽

Paul O'Brien ◽

David J. Otway ◽

Jin-Ho Park

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gallium Sulfide ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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La2S3thin films from metal organic chemical vapor deposition of single-source precursor

Journal of Materials Chemistry ◽

10.1039/b511981b ◽

2006 ◽

Vol 16 (3) ◽

pp. 272-277 ◽

Author(s):

Lu Tian ◽

Ti Ouyang ◽

Kian Ping Loh ◽

Jagadese J. Vittal

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm035287o ◽

2004 ◽

Vol 16 (17) ◽

pp. 3289-3298 ◽

Author(s):

John Waters ◽

David Crouch ◽

James Raftery ◽

Paul O'Brien

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Chalcogenide Thin Films ◽

Organic Chemical Vapor Deposition

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Comparative Study of the Metal Organic Chemical Vapor Deposition of β-CoGa Thin Films from Dialkylgallium Tetracarbonylcobaltate Single-Source Precursors

Chemistry of Materials ◽

10.1021/cm9504044 ◽

1996 ◽

Vol 8 (2) ◽

pp. 497-508 ◽

Author(s):

Roland A. Fischer ◽

Alexander Miehr

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Large area double‐sided YBa2Cu3O7−δ films grown by single‐source metal‐organic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.115283 ◽

1995 ◽

Vol 67 (5) ◽

pp. 712-714 ◽

Author(s):

Z. Lu ◽

J. K. Truman ◽

M. E. Johansson ◽

D. Zhang ◽

C. F. Shih ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Heteroepitaxy of LaAlO3(100) on SrTiO3(100): In Situ Growth of LaAlO3Thin Films by Metal−Organic Chemical Vapor Deposition from a Liquid Single Source

Chemistry of Materials ◽

10.1021/cm9804970 ◽

1998 ◽

Vol 10 (12) ◽

pp. 3765-3768 ◽

Author(s):

Graziella Malandrino ◽

Ignazio L. Fragalà ◽

Paolo Scardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Single Source ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Preparation of CdS coatings on the inner surface of silica aerogels by single-source metal-organic chemical vapor deposition at atmospheric pressure

Thin Solid Films ◽

10.1016/j.tsf.2009.10.004 ◽

2010 ◽

Vol 518 (14) ◽

pp. 3700-3704 ◽

Author(s):

Hongbo Ren ◽

Lin Zhang ◽

Xiaobo Wan ◽

Yutie Bi ◽

Yong Zhang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Silica Aerogels ◽

Organic Chemical ◽

Single Source ◽

Inner Surface ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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