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La2S3thin films from metal organic chemical vapor deposition of single-source precursor
Journal of Materials Chemistry
◽
10.1039/b511981b
◽
2006
◽
Vol 16
(3)
◽
pp. 272-277
◽
Cited By ~ 17
Author(s):
Lu Tian
◽
Ti Ouyang
◽
Kian Ping Loh
◽
Jagadese J. Vittal
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Single Source Precursor
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
Download Full-text
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References
Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal−Organic Chemical Vapor Deposition
Chemistry of Materials
◽
10.1021/cm9905040
◽
1999
◽
Vol 11
(12)
◽
pp. 3430-3432
◽
Cited By ~ 37
Author(s):
Mike R. Lazell
◽
Paul O'Brien
◽
David J. Otway
◽
Jin-Ho Park
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Gallium Sulfide
◽
Single Source Precursor
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
Download Full-text
ChemInform Abstract: Metal-Organic Chemical Vapor Deposition of Semiconducting III/VI In2Se3 Thin Films from the Single-Source Precursor: In(SeC(SiMe3)3)3.
ChemInform
◽
10.1002/chin.199612269
◽
2010
◽
Vol 27
(12)
◽
pp. no-no
Author(s):
J. CHEON
◽
J. ARNOLD
◽
K.-M. YU
◽
E. D. BOURRET
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Single Source Precursor
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
Download Full-text
ChemInform Abstract: Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal-Organic Chemical Vapor Deposition.
ChemInform
◽
10.1002/chin.200011022
◽
2010
◽
Vol 31
(11)
◽
pp. no-no
Author(s):
Mike R. Lazell
◽
Paul O'Brien
◽
David J. Otway
◽
Jin-Ho Park
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Gallium Sulfide
◽
Single Source Precursor
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
Download Full-text
Metal-organic chemical vapor deposition of indium selenide films using a single-source precursor
Materials Science and Engineering B
◽
10.1016/j.mseb.2004.05.044
◽
2005
◽
Vol 116
(3)
◽
pp. 391-394
◽
Cited By ~ 25
Author(s):
Mohammad Afzaal
◽
David Crouch
◽
Paul O’Brien
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Indium Selenide
◽
Organic Chemical
◽
Single Source
◽
Single Source Precursor
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
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Homoleptic Gadolinium Guanidinate: A Single Source Precursor for Metal−Organic Chemical Vapor Deposition of Gadolinium Nitride Thin Films
Journal of the American Chemical Society
◽
10.1021/ja907952g
◽
2009
◽
Vol 131
(47)
◽
pp. 17062-17063
◽
Cited By ~ 40
Author(s):
Andrian P. Milanov
◽
Tobias B. Thiede
◽
Anjana Devi
◽
Roland A. Fischer
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Gadolinium Nitride
◽
Single Source Precursor
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
Download Full-text
Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition.
ChemInform
◽
10.1002/chin.200443025
◽
2004
◽
Vol 35
(43)
◽
Author(s):
John Waters
◽
David Crouch
◽
James Raftery
◽
Paul O'Brien
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Single Source Precursors
◽
Metal Organic
◽
Chalcogenide Thin Films
◽
Organic Chemical Vapor Deposition
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Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition
Chemistry of Materials
◽
10.1021/cm035287o
◽
2004
◽
Vol 16
(17)
◽
pp. 3289-3298
◽
Cited By ~ 83
Author(s):
John Waters
◽
David Crouch
◽
James Raftery
◽
Paul O'Brien
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Single Source Precursors
◽
Metal Organic
◽
Chalcogenide Thin Films
◽
Organic Chemical Vapor Deposition
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Comparative Study of the Metal Organic Chemical Vapor Deposition of β-CoGa Thin Films from Dialkylgallium Tetracarbonylcobaltate Single-Source Precursors
Chemistry of Materials
◽
10.1021/cm9504044
◽
1996
◽
Vol 8
(2)
◽
pp. 497-508
◽
Cited By ~ 15
Author(s):
Roland A. Fischer
◽
Alexander Miehr
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Comparative Study
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Single Source Precursors
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
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Large area double‐sided YBa2Cu3O7−δ films grown by single‐source metal‐organic chemical vapor deposition
Applied Physics Letters
◽
10.1063/1.115283
◽
1995
◽
Vol 67
(5)
◽
pp. 712-714
◽
Cited By ~ 23
Author(s):
Z. Lu
◽
J. K. Truman
◽
M. E. Johansson
◽
D. Zhang
◽
C. F. Shih
◽
...
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Single Source
◽
Large Area
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
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Heteroepitaxy of LaAlO3(100) on SrTiO3(100): In Situ Growth of LaAlO3Thin Films by Metal−Organic Chemical Vapor Deposition from a Liquid Single Source
Chemistry of Materials
◽
10.1021/cm9804970
◽
1998
◽
Vol 10
(12)
◽
pp. 3765-3768
◽
Cited By ~ 25
Author(s):
Graziella Malandrino
◽
Ignazio L. Fragalà
◽
Paolo Scardi
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
In Situ Growth
◽
Single Source
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
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