A compact neutron spectrometer system

Author(s):  
T.C. Borgwardt ◽  
K.D. Bartlett ◽  
K. Smith ◽  
K.C. Meierbachtol
1997 ◽  
Author(s):  
Harlan W. Lefevre ◽  
R. J. Rasmussen ◽  
Michael S. Chmelik ◽  
R. M. S. Schofield ◽  
G. E. Sieger ◽  
...  

2021 ◽  
Vol 136 (6) ◽  
Author(s):  
Ngoc-Thiem Le ◽  
Ngoc-Quynh Nguyen ◽  
Huu-Quyet Nguyen ◽  
Duc-Khue Pham ◽  
Minh-Cong Nguyen ◽  
...  

Author(s):  
P. E. Batson ◽  
C. H. Chen ◽  
J. Silcox

Electron energy loss experiments combined with microscopy have proven to be a valuable tool for the exploration of the structure of electronic excitations in materials. These types of excitations, however, are difficult to measure because of their small intensity. In a usual situation, the filament of the microscope is run at a very high temperature in order to present as much intensity as possible at the specimen. This results in a degradation of the ultimate energy resolution of the instrument due to thermal broadening of the electron beam.We report here observations and measurements on a new LaB filament in a microscope-velocity spectrometer system. We have found that, in general, we may retain a good energy resolution with intensities comparable to or greater than those available with the very high temperature tungsten filament. We have also explored the energy distribution of this filament.


1986 ◽  
Vol 75 ◽  
Author(s):  
Harold F. Winters ◽  
D. Haarer

AbstractIt has been recognized for some time that the doping level in silicon influences etch rate in plasma environments[1–8]. We have now been able to reproduce and investigate these doping effects in a modulated-beam, mass spectrometer system described previously [9] using XeF2 as the etchant gas. The phenomena which have been observed in plasma reactors containing fluorine atoms are also observed in our experiments. The data has led to a model which explains the major trends.


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