The effect of crystal orientation on the behavior of a polycrystalline tungsten surface under focused Ga+ ion bombardment

Author(s):  
Guang Ran ◽  
Shenghua Wu ◽  
Xiang Liu ◽  
Jihong Wu ◽  
Ning Li ◽  
...  
1984 ◽  
Vol 141 (2-3) ◽  
pp. A203
Author(s):  
Hirofumi Miki ◽  
Hiroki Inomażta ◽  
Kazutoshi Kato ◽  
Toshihide Kioka ◽  
Koji Kawasaki

1984 ◽  
Vol 141 (2-3) ◽  
pp. 473-486 ◽  
Author(s):  
Hirofumi Miki ◽  
Hiroki Inomata ◽  
Kazutoshi Kato ◽  
Toshihide Kioka ◽  
Koji Kawasaki

2009 ◽  
Vol 105 (5) ◽  
pp. 054506 ◽  
Author(s):  
Byeong-Yun Oh ◽  
Won-Kyu Lee ◽  
Young-Hwan Kim ◽  
Dae-Shik Seo

2005 ◽  
Vol 908 ◽  
Author(s):  
Abdurauf Dzhurakhalov ◽  
Sirojiddin Rahmatov ◽  
Nigorakhon Teshabaeva ◽  
Maqsud Yusupov

AbstractThe ion sputtering and implantation into GaAs(001) surface at 1-5 keV Se+ grazing ion bombardment have been investigated by computer simulation.The azimuth angular dependencies of sputtering and penetration yield at grazing incidence have been calculated. It was observed that these dependencies correlate the crystal orientation. The depth distributions of 1-5 keV Se ions implanted into GaAs(001) for several azimuth angles of incidence have been presented.


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