Leakage current reduction in pentacene-based thin film transistor using asymmetric source/drain electrodes

2012 ◽  
Vol 13 (6) ◽  
pp. 1056-1059 ◽  
Author(s):  
Myung-Hoon Lim ◽  
In-Yeal Lee ◽  
Seong-Guk Jeong ◽  
Jongtaek Lee ◽  
Woo-Shik Jung ◽  
...  
2021 ◽  
pp. 106413
Author(s):  
Yuexin Yang ◽  
Zhuohui Xu ◽  
Tian Qiu ◽  
Honglong Ning ◽  
Jinyao Zhong ◽  
...  

2007 ◽  
Vol 124-126 ◽  
pp. 259-262
Author(s):  
Jae Hong Jeon ◽  
Kang Woong Lee

We investigated the effect of amorphous silicon pattern design regarding to light induced leakage current in amorphous silicon thin film transistor. In addition to conventional design, where amorphous silicon layer is protruding outside the gate electrode, we designed and fabricated amorphous silicon thin film transistors in another two types of bottom gated structure. The one is that the amorphous silicon layer is located completely inside the gate electrode and the other is that the amorphous silicon layer is protruding outside the gate electrode but covered completely by the source and drain electrode. Measurement of the light induced leakage current caused by backlight revealed that the design where the amorphous silicon is located inside the gate electrode was the most effective however the last design was also effective in reducing the leakage current about one order lower than that of the conventional design.


2009 ◽  
Vol 30 (3) ◽  
pp. 240-242 ◽  
Author(s):  
Hyun-Sang Park ◽  
Hee-Sun Shin ◽  
Woocheul Lee ◽  
Seung-Hee Kuk ◽  
Yongtaek Hong ◽  
...  

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