An empirical model for leakage current in poly-silicon thin film transistor

2000 ◽  
Vol 44 (11) ◽  
pp. 2015-2019 ◽  
Author(s):  
M.J. Siddiqui ◽  
S. Qureshi
2003 ◽  
Author(s):  
Guglielmo Fortunato ◽  
Antonio Valletta ◽  
Alessandra Bonfiglietti ◽  
Massimo Cuscuna ◽  
Paolo Gaucci ◽  
...  

2007 ◽  
Vol 124-126 ◽  
pp. 259-262
Author(s):  
Jae Hong Jeon ◽  
Kang Woong Lee

We investigated the effect of amorphous silicon pattern design regarding to light induced leakage current in amorphous silicon thin film transistor. In addition to conventional design, where amorphous silicon layer is protruding outside the gate electrode, we designed and fabricated amorphous silicon thin film transistors in another two types of bottom gated structure. The one is that the amorphous silicon layer is located completely inside the gate electrode and the other is that the amorphous silicon layer is protruding outside the gate electrode but covered completely by the source and drain electrode. Measurement of the light induced leakage current caused by backlight revealed that the design where the amorphous silicon is located inside the gate electrode was the most effective however the last design was also effective in reducing the leakage current about one order lower than that of the conventional design.


2017 ◽  
Vol 17 (5) ◽  
pp. 3465-3468
Author(s):  
Hyung Yoon Kim ◽  
Ki Hwan Seok ◽  
Zohreh Kiaee ◽  
Hee Jae Chae ◽  
Sol Kyu Lee ◽  
...  

1990 ◽  
Vol 26 (16) ◽  
pp. 1284 ◽  
Author(s):  
M.J. Izzard ◽  
P. Migliorato ◽  
W.I. Milne

2019 ◽  
Vol 13 (1) ◽  
pp. 151-155
Author(s):  
Tung-Ming Pan ◽  
Tin-Wei Wu ◽  
Ching-Lin Chan ◽  
Kai-Ming Chen ◽  
Chih-Hong Lee

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