scholarly journals The Improved Self-assembled Monolayer of Octadecyltrichlorosilane as Positive Resist for Patterning Silicon Surface by Metastable Helium Atom Beam Lithography

2012 ◽  
Vol 32 ◽  
pp. 525-531
Author(s):  
Z.P. Wang ◽  
M. Kurahashi ◽  
T. Suzuki ◽  
X. Sun ◽  
Z.M. Zhang ◽  
...  
Keyword(s):  
Helium Atom ◽  
Silicon Surface ◽  
Atom Beam ◽  
Self Assembled Monolayer ◽  
Metastable Helium ◽  
Metastable Helium Atom ◽  
Self Assembled ◽  
Positive Resist

Silicon Micro/Nanofabrication Using Metastable Helium Atom Beam Lithography

2010 ◽  
Vol 10 (11) ◽  
pp. 7443-7446
Author(s):  
Z. P. Wang ◽  
M. Kurahashi ◽  
T. Suzuki ◽  
Z. J. Ding ◽  
Y. Yamauchi
Keyword(s):  
Helium Atom ◽  
Atom Beam ◽  
Metastable Helium ◽  
Metastable Helium Atom
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