Resistance switching mechanism of La0.8Sr0.2MnO3−δ thin films

2016 ◽  
Vol 483 ◽  
pp. 99-102 ◽  
Author(s):  
X.D. Luo ◽  
R.L. Gao ◽  
C.L. Fu ◽  
W. Cai ◽  
G. Chen ◽  
...  
2008 ◽  
Vol 1071 ◽  
Author(s):  
Ramanathaswamy Pandian ◽  
Bart J. Kooi ◽  
George Palasantzas ◽  
Jeff Th. M. De Hosson

AbstractBesides the well-known resistance switching originating from the amorphous-crystalline phase-change in GeSbTe thin films, we demonstrate another switching mechanism named ‘polarity-dependent resistance (PDR) switching’. The electrical resistance of the film switches between a low- and high-state when the polarity of the applied electric field is reversed. This switching is not connected to the phase-change, as it only occurs in the crystalline phase of the film, but connected to the solid-state electrolytic behavior i.e. high ionic conductivity of (Sb-rich) GeSbTe under an electric field. I-V characteristics of nonoptimized capacitor-like prototype cells of various dimensions clearly exhibited the switching behavior when sweeping the voltage between +1 V and -1 V (starting point: 0 V). The switching was demonstrated also with voltage pulses of amplitudes down to 1 V and pulse widths down to 1 microsecond for several hundred of cycles with resistance contrasts up to 150 % between the resistance states. Conductive atomic force microscopy (CAFM) was used to examine PDR switching at nanoscales in tip-written crystalline marks, where the switching occurred for less than 1.5 V with more than three orders of resistance contrasts. Our experiments demonstrated a novel and technologically important switching mechanism, which consumes less power than the usual phase-change switching and provide opportunity to bring together the two resistance switching types (phase-change and PDR) in a single system to extend the applicability of GeSbTe materials.


1988 ◽  
Vol 3 (12) ◽  
pp. 838-847
Author(s):  
F. Kugiya ◽  
M. Suzuki ◽  
K. Yoshida ◽  
O. Kitakami

2009 ◽  
Vol 66 ◽  
pp. 131-134
Author(s):  
X. Cao ◽  
Xiao Min Li ◽  
Wei Dong Yu ◽  
Rui Yang ◽  
Xin Jun Liu

Polycrystalline NiO thin films were fabricated on Pt (111)/Ti/SiO2/Si substrates by thermal oxidation of the evaporated Ni films. Pt/NiO/Pt structures were prepared, and they showed reversible resistance switching behaviors. When the compliance set current was varied from 5 mA to 40 mA, the on-state currents increased, while the on-state resistances decreased. It is probably attributed to higher current compliance resulted in the formation of stronger and less resistive filaments, which in turn need more energy and power for their rupture. The resistive switching in NiO thin films is closely related to the formation and rupture of conducting filaments.


2006 ◽  
Vol 243 (9) ◽  
pp. 2089-2097 ◽  
Author(s):  
A. Ignatiev ◽  
N. J. Wu ◽  
X. Chen ◽  
S. Q. Liu ◽  
C. Papagianni ◽  
...  

2015 ◽  
Vol 3 (43) ◽  
pp. 11357-11365 ◽  
Author(s):  
Geert Rampelberg ◽  
Bob De Schutter ◽  
Wouter Devulder ◽  
Koen Martens ◽  
Iuliana Radu ◽  
...  

VO2 and V2O3 thin films were prepared during in situ XRD investigation by oxidation and reduction of V and V2O5. Films show up to 5 orders of magnitude resistance switching.


2010 ◽  
Vol 97 (4) ◽  
pp. 042101 ◽  
Author(s):  
Kuibo Yin ◽  
Mi Li ◽  
Yiwei Liu ◽  
Congli He ◽  
Fei Zhuge ◽  
...  

2007 ◽  
Vol 51 (3) ◽  
pp. 1089 ◽  
Author(s):  
Mooyoung Kim ◽  
Hyungsang Kim ◽  
Yongmin Kim ◽  
Woong Jung ◽  
Hyunsik Im ◽  
...  

ACS Omega ◽  
2020 ◽  
Vol 5 (30) ◽  
pp. 19050-19060
Author(s):  
Misbah Sehar Abbasi ◽  
Muhammad Sultan Irshad ◽  
Naila Arshad ◽  
Iftikhar Ahmed ◽  
Muhammad Idrees ◽  
...  

2011 ◽  
Vol 519 (10) ◽  
pp. 3291-3294 ◽  
Author(s):  
Chang Hwa Jung ◽  
Seong Ihl Woo ◽  
Yun Seok Kim ◽  
Kwang Soo No

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