Reversible Electrical Resistance Switching in GeSbTe Thin Films: An Electrolytic Approach without Amorphous-Crystalline Phase-Change

2008 ◽  
Vol 1071 ◽  
Author(s):  
Ramanathaswamy Pandian ◽  
Bart J. Kooi ◽  
George Palasantzas ◽  
Jeff Th. M. De Hosson

AbstractBesides the well-known resistance switching originating from the amorphous-crystalline phase-change in GeSbTe thin films, we demonstrate another switching mechanism named ‘polarity-dependent resistance (PDR) switching’. The electrical resistance of the film switches between a low- and high-state when the polarity of the applied electric field is reversed. This switching is not connected to the phase-change, as it only occurs in the crystalline phase of the film, but connected to the solid-state electrolytic behavior i.e. high ionic conductivity of (Sb-rich) GeSbTe under an electric field. I-V characteristics of nonoptimized capacitor-like prototype cells of various dimensions clearly exhibited the switching behavior when sweeping the voltage between +1 V and -1 V (starting point: 0 V). The switching was demonstrated also with voltage pulses of amplitudes down to 1 V and pulse widths down to 1 microsecond for several hundred of cycles with resistance contrasts up to 150 % between the resistance states. Conductive atomic force microscopy (CAFM) was used to examine PDR switching at nanoscales in tip-written crystalline marks, where the switching occurred for less than 1.5 V with more than three orders of resistance contrasts. Our experiments demonstrated a novel and technologically important switching mechanism, which consumes less power than the usual phase-change switching and provide opportunity to bring together the two resistance switching types (phase-change and PDR) in a single system to extend the applicability of GeSbTe materials.

2013 ◽  
Vol 706-708 ◽  
pp. 82-84
Author(s):  
Bing Cheng Sun ◽  
Hua Wang ◽  
Ji Wen Xu

Nonvolatile of polycrystalline Bi4Ti3O12 thin films prepared by solgel method were studied, and the effect of annealing temperature on resistance switching behavior has been studied. The main point is accented on decrease the operation voltage. Two controllable resistance states were observed by applying voltage pulses. It was also found that the conduction mechanisms dominating the low and high resistance states are Ohmic behavior and Space Charge Limited Current(SCLC).


Author(s):  
Ajit Achuthan ◽  
Chin-Teh Sun

A method to characterize the strain electric field butterfly behavior based on the underlying domain switching mechanism is presented at first. The effect of loading rate on the different characteristics of the strain electric-field-butterfly behavior is then studied. By comparing the changes in these characteristics under different loading rates, it is established that the loading rate dependence of the strain electric field butterfly behavior is mainly due to two factors, 1) the dependence of the switching of individual domains on the magnitude and duration of the loading time and 2) the variation of the transition electric field with the loading rate. Several interesting attributes of the domain switching behavior that may shed light on understanding the underlying mechanism of domain switching further is illustrated in the present study. The present study also demonstrates that the method of characterizing the strain electric butterfly based on the underlying domain switching mechanism is very effective in studying ferroelectric behavior under different loading conditions.


2008 ◽  
Vol 47 (3) ◽  
pp. 1635-1638 ◽  
Author(s):  
Dong-Wook Kim ◽  
Ranju Jung ◽  
Bae Ho Park ◽  
Xiang-Shu Li ◽  
Chanwoo Park ◽  
...  

2016 ◽  
Vol 483 ◽  
pp. 99-102 ◽  
Author(s):  
X.D. Luo ◽  
R.L. Gao ◽  
C.L. Fu ◽  
W. Cai ◽  
G. Chen ◽  
...  

Author(s):  
Sungkyu Son ◽  
Seungjoon Jeon ◽  
Jangwon Oh ◽  
Won Kim ◽  
Hojoung Kim ◽  
...  

Abstract It is important to understand the switching mechanism of phase change material for failure analysis of PRAM device. In this study, the real time observations of phase transition and void formation mechanism of confined GST structure were investigated using in-situ TEM with multi-pulse AC biasing technique. In-situ SET switching behavior between amorphous state and crystalline state with continuous structural change was successfully observed. Volume shrink of GST, due to the phase transition, induced voids at grain boundary of crystalline phase. Excess Joule-heating after crystallization caused coalescence and migration of voids. These results may give us a crucial clue for endurance failure analysis of PRAM.


2012 ◽  
Vol 11 (04) ◽  
pp. 1240025
Author(s):  
MATHIEU MORETTI ◽  
MISCHA NICKLAUS ◽  
CHRISTIAN NAUENHEIM ◽  
ANDREAS RUEDIGER

We report on a scanning probe investigation of the resistive switching behavior of TiO2 thin films as a function of an external bias voltage. Our initial conductive atomic force microscopy scans (c-AFM) on 30 nm thick films of sputtered TiO2 confirm the Ron–Roff ratio of approximately 4:1 reported in literature. After a tapping mode scan that compacts this layer by approximately 3%, a subsequent c-AFM scan reveals that the resistance in the compacted region has increased by a factor of 40 while the Ron–Roff ratio is only affected for small bias voltages.


2009 ◽  
Vol 95 (25) ◽  
pp. 252109 ◽  
Author(s):  
Ramanathaswamy Pandian ◽  
Bart J. Kooi ◽  
Jasper L. M. Oosthoek ◽  
Pim van den Dool ◽  
George Palasantzas ◽  
...  

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