Low-temperature hermetic thermo-compression bonding using electroplated copper sealing frame planarized by fly-cutting for wafer-level MEMS packaging

2018 ◽  
Vol 279 ◽  
pp. 671-679 ◽  
Author(s):  
Muhammad Salman Al Farisi ◽  
Hideki Hirano ◽  
Shuji Tanaka
1999 ◽  
Vol 605 ◽  
Author(s):  
Christine H. Tsau ◽  
Martin A. Schmidt ◽  
S. Mark Spearing

AbstractLow temperature, wafer-level bonding offers several advantages in MEMS packaging, such as device protection during aggressive processing/handling and the possibility of vacuum sealing. Although thermocompression bonding can be achieved with a variety of metals, gold is often preferred because of its acceptance in die bonding [1] and its resistance to oxidation. This study demonstrates that the simultaneous application of moderate pressure (0.5 MPa) and temperature (300°C) produces strong wafer-level bonds. A four-point benddelamination technique was utilized to quantify bond toughness. Test specimens exhibited constant load versus displacement behavior during steady state crack propagation. Two distinct fracture modes were observed: cohesive failure within the Au and adhesive failure at the Ti-Si interface. The strain energy release rate for Au-Au fracture was found to be higher than that associated with Ti-Si fracture, consistent with the greater plastic deformation that occurs in the metal during fracture.


Author(s):  
Young Ho Seo ◽  
Tae Goo Kang ◽  
Young-Ho Cho ◽  
Seong-A. Kim ◽  
Geun Ho Kim ◽  
...  

In this paper, locally heated closed-loop AuSn solder-line bonding method was proposed and evaluated for a low-temperature, high strength, and hermetic MEMS packaging. We fabricated two different test specimens including substrate-heated specimen and locally heated specimen in order to verify the performance of locally heated method. In air tightness test, the substrate-heated specimen and locally heated specimen show the maximum leak rate of 13.5±9.8×10−10mbar-l/s and 18.8±9.9×10−10mbar-l/s with the same internal volume of 6.89±0.2×10−6l, respectively. In the critical pressure test, any fracture was not found in the bonded specimens at applied pressure of 10±2bar. From these results, we approximately extracted the bonding strength of the proposed bonding process of 3.53±0.07MPa. By EDS (Energy Dispersive X-ray Spectrometer) analysis at bonded interface, we found that bonded interface (between AuSn solder and Ti/Au layer) of substrate-heated specimen was stronger than that of locally heated specimen.


2008 ◽  
Vol 143 (2) ◽  
pp. 323-328 ◽  
Author(s):  
Yong-Kook Kim ◽  
Eun-Kyung Kim ◽  
Soo-Won Kim ◽  
Byeong-Kwon Ju

2013 ◽  
Vol 23 (7) ◽  
pp. 075007 ◽  
Author(s):  
R Straessle ◽  
Y Pétremand ◽  
D Briand ◽  
M Dadras ◽  
N F de Rooij

Author(s):  
Shin Ito ◽  
Jun Mizuno ◽  
Hiroyuki Ishida ◽  
Toshinori Ogashiwa ◽  
Yukio Kanehira ◽  
...  

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