Structural characterization of V2O5–TiO2 thin films deposited by RF sputtering from a titanium target with vanadium insets

2005 ◽  
Vol 109 (1) ◽  
pp. 47-51 ◽  
Author(s):  
I. Alessandri ◽  
E. Comini ◽  
E. Bontempi ◽  
G. Sberveglieri ◽  
L.E. Depero
2003 ◽  
Vol 6 (5-6) ◽  
pp. 547-550 ◽  
Author(s):  
B. Karunagaran ◽  
R.T. Rajendra Kumar ◽  
V. Senthil Kumar ◽  
D. Mangalaraj ◽  
Sa.K. Narayandass ◽  
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1999 ◽  
Vol 137 (1-4) ◽  
pp. 38-44 ◽  
Author(s):  
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E. Haro-Poniatowski ◽  
M.A. Camacho-López ◽  
M. Fernández-Guasti ◽  
J. Jı́menez-Jarquı́n ◽  
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2001 ◽  
Vol 174 (1) ◽  
pp. 35-39 ◽  
Author(s):  
Xiaohua Liu ◽  
J. Yin ◽  
Z.G. Liu ◽  
X.B. Yin ◽  
G.X. Chen ◽  
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1998 ◽  
Vol 50 (1-4) ◽  
pp. 13-18 ◽  
Author(s):  
Tooru Tanaka ◽  
Nobutaka Tanahashi ◽  
Toshiyuki Yamaguchi ◽  
Akira Yoshida
Keyword(s):  

2001 ◽  
Vol 36 (15) ◽  
pp. 2613-2626 ◽  
Author(s):  
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C.H Bhosale

1998 ◽  
Vol 264-268 ◽  
pp. 1225-1228 ◽  
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Sukkaneste Tungasmita ◽  
Jens Birch ◽  
L. Hultman ◽  
Erik Janzén ◽  
J.-E. Sundgren

1993 ◽  
Vol 65-66 ◽  
pp. 313-318 ◽  
Author(s):  
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M.C. Nicotra ◽  
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R. Rella ◽  
P. Siciliano

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