Structural characterization of V2O5–TiO2 thin films deposited by RF sputtering from a titanium target with vanadium insets
2005 ◽
Vol 109
(1)
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pp. 47-51
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2003 ◽
Vol 6
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pp. 547-550
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1999 ◽
Vol 137
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pp. 38-44
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2013 ◽
Vol 307
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pp. 477-481
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2001 ◽
Vol 174
(1)
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pp. 35-39
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1998 ◽
Vol 50
(1-4)
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pp. 13-18
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2001 ◽
Vol 206-213
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pp. 531-534
2001 ◽
Vol 36
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pp. 2613-2626
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1998 ◽
Vol 264-268
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pp. 1225-1228
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1993 ◽
Vol 65-66
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pp. 313-318
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