Hydrogen absorption and re-emission characteristics of metal–oxide bi-layer composite materials measured by ion beam analysis

2011 ◽  
Vol 192 (1) ◽  
pp. 30-33 ◽  
Author(s):  
B. Tsuchiya ◽  
S. Nagata ◽  
K. Morita
2018 ◽  
Vol 32 (34n36) ◽  
pp. 1840067 ◽  
Author(s):  
F. Fang ◽  
J. Rogers ◽  
P. P. Murmu ◽  
J. Kennedy

Copper oxide is a semiconducting compound with a narrow band gap and is used for photoconductive and photothermal applications. Most of the synthesis methods for the preparation of copper oxide composite materials either are unsuitable for mass fabrication or inevitably introduce unwanted impurities. In this work, we report on the synthesis of copper oxide composite materials by the arc discharge method with a pure copper rod as the anode and graphite as the cathode. Ion beam analysis techniques, particle-induced X-ray emission and Rutherford backscattering spectrometry were used to probe the impurities in the copper oxide composites. Ion beam analysis results revealed copper and oxygen as constituent elements with no impurities. X-ray diffraction results discovered the presence of CuO, Cu2O and Cu phases in the composite materials. The morphology of the as-synthesized copper oxide was studied by scanning electron microscopy. Results clearly demonstrated that spherical particles were obtained with an average diameter of 14 [Formula: see text]m (range 2–85 [Formula: see text]m), 35 [Formula: see text]m (range 20–100 [Formula: see text]m) and 50 [Formula: see text]m (range 30–120 [Formula: see text]m) for the arc current of 60 A, 80 A and 95 A, respectively. It was found that the morphology can be controlled by the arc discharge parameters, e.g. a lower arc discharge current contributed to a smaller particle size. This is because the electric arc current influences the nucleation and the growth of the spherical structures. Due to its simplicity of synthesis, the proposed arc discharge is a promising technique for the fabrication of copper oxide composite materials for optical and electrical applications.


2019 ◽  
Vol 297 ◽  
pp. 100-110 ◽  
Author(s):  
Nick Lucas ◽  
Kelsey E. Seyfang ◽  
Andrew Plummer ◽  
Michael Cook ◽  
K. Paul Kirkbride ◽  
...  

Instruments ◽  
2021 ◽  
Vol 5 (1) ◽  
pp. 10
Author(s):  
Sören Möller ◽  
Daniel Höschen ◽  
Sina Kurth ◽  
Gerwin Esser ◽  
Albert Hiller ◽  
...  

The analysis of material composition by ion-beam analysis (IBA) is becoming a standard method, similar to electron microscopy. A pool of IBA methods exists, from which the combination of particle-induced-X-ray emission (PIXE), particle induced gamma-ray analysis (PIGE), nuclear-reaction-analysis (NRA), and Rutherford-backscattering-spectrometry (RBS) provides the most complete analysis over the whole periodic table in a single measurement. Yet, for a highly resolved and accurate IBA analysis, a sophisticated technical setup is required integrating the detectors, beam optics, and sample arrangement. A new end-station developed and installed in Forschungszentrum Jülich provides these capabilities in combination with high sample throughput and result accuracy. Mechanical tolerances limit the device accuracy to 3% for RBS. Continuous pumping enables 5*10−8 mbar base pressure with vibration amplitudes < 0.1 µm. The beam optics achieves a demagnification of 24–34, suitable for µ-beam analysis. An in-vacuum manipulator enables scanning 50 × 50 mm² sample areas with 10 nm accuracy. The setup features the above-mentioned IBA detectors, enabling a broad range of analysis applications such as the operando analysis of batteries or the post-mortem analysis of plasma-exposed samples with up to 3000 discrete points per day. Custom apertures and energy resolutions down to 11 keV enable separation of Fe and Cr in RBS. This work presents the technical solutions together with the quantification of these challenges and their success in the form of a technical reference.


Author(s):  
P. Wei ◽  
M. Chicoine ◽  
S. Gujrathi ◽  
F. Schiettekatte ◽  
J.-N. Beaudry ◽  
...  

1999 ◽  
Vol 12 (3) ◽  
pp. 457-467 ◽  
Author(s):  
Narayan Sundararajan ◽  
Christopher F. Keimel ◽  
Navin Bhargava ◽  
Christopher K. Ober ◽  
Juliann Opitz ◽  
...  

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