Surface modification of silicon oxycarbide films produced by remote hydrogen microwave plasma chemical vapour deposition from tetramethyldisiloxane precursor
2018 ◽
Vol 350
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pp. 686-698
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2001 ◽
Vol 142-144
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pp. 314-320
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1991 ◽
Vol 47
(1-3)
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pp. 13-21
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2007 ◽
Vol 61
(11-12)
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pp. 2243-2246
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2012 ◽
Vol 42
(11)
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pp. 959-960
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