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Surface characteristics of a dental implant modified by low energy oxygen ion implantation
Surface and Coatings Technology
◽
10.1016/j.surfcoat.2018.09.003
◽
2019
◽
Vol 365
◽
pp. 208-213
◽
Cited By ~ 11
Author(s):
Zeng Lin
◽
Shao-Jie Li
◽
Fei Sun
◽
De-Chun Ba
◽
Xin-Chang Li
Keyword(s):
Ion Implantation
◽
Dental Implant
◽
Surface Characteristics
◽
Low Energy
◽
Oxygen Ion
◽
Oxygen Ion Implantation
Download Full-text
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References
Application of Oxygen Ion Implantation to Titanium Surfaces: Effects on Surface Characteristics, Corrosion Resistance, and Bone Response
Clinical Implant Dentistry and Related Research
◽
10.1111/j.1708-8208.2001.tb00144.x
◽
2001
◽
Vol 3
(4)
◽
pp. 221-229
◽
Cited By ~ 28
Author(s):
Takashi Sawase
◽
Ann Wennerberg
◽
Koumei Baba
◽
Yoichi Tsuboi
◽
Lars Sennerby
◽
...
Keyword(s):
Corrosion Resistance
◽
Ion Implantation
◽
Surface Characteristics
◽
Oxygen Ion
◽
Bone Response
◽
Titanium Surfaces
◽
Oxygen Ion Implantation
Download Full-text
Preparation of multilayered thin silicon‐on‐insulator structure by low‐energy oxygen ion implantation
Applied Physics Letters
◽
10.1063/1.107490
◽
1992
◽
Vol 61
(13)
◽
pp. 1543-1545
◽
Cited By ~ 13
Author(s):
Yukari Ishikawa
◽
Noriyoshi Shibata
Keyword(s):
Ion Implantation
◽
Low Energy
◽
Silicon On Insulator
◽
Oxygen Ion
◽
Thin Silicon
◽
Oxygen Ion Implantation
Download Full-text
Fabrication of highly oriented Si:SiO2 nanoparticles using low energy oxygen ion implantation during Si molecular beam epitaxy
Applied Physics Letters
◽
10.1063/1.115874
◽
1996
◽
Vol 68
(16)
◽
pp. 2249-2251
◽
Cited By ~ 21
Author(s):
Yukari Ishikawa
◽
N. Shibata
◽
S. Fukatsu
Keyword(s):
Molecular Beam Epitaxy
◽
Ion Implantation
◽
Molecular Beam
◽
Low Energy
◽
Oxygen Ion
◽
Oxygen Ion Implantation
Download Full-text
Formation of thin silicon films using low energy oxygen ion implantation
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
◽
10.1016/0168-583x(91)96229-e
◽
1991
◽
Vol 55
(1-4)
◽
pp. 555-560
◽
Cited By ~ 32
Author(s):
A.K. Robinson
◽
C.D. Marsh
◽
U. Bussmann
◽
J.A. Kilner
◽
Y. Li
◽
...
Keyword(s):
Ion Implantation
◽
Low Energy
◽
Silicon Films
◽
Oxygen Ion
◽
Thin Silicon
◽
Oxygen Ion Implantation
Download Full-text
Low Energy Oxygen Ion Implantation and Ion-Bombardment Induced Oxidation of Silicon, Studied by SIMS, AES, and XPS
Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS IV
◽
10.1007/978-3-642-82256-8_66
◽
1984
◽
pp. 244-247
◽
Cited By ~ 1
Author(s):
P. Sander
◽
U. Kaiser
◽
O. Ganschow
◽
R. Jede
◽
L. Wiedmann
◽
...
Keyword(s):
Ion Implantation
◽
Ion Bombardment
◽
Low Energy
◽
Oxygen Ion
◽
Oxygen Ion Implantation
Download Full-text
Fermi Level Modulation of n-type Doped Single Walled Carbon Nanotube using Buried Local-Gate FET Structure by Oxygen Ion Implantation with Ultra-low Energy Ion Beam of 25eV
10.7567/ssdm.2005.g-7-5
◽
2005
◽
Author(s):
Takafumi Kamimura
◽
Kazuhiro Yamamoto
◽
Kazuhiko Matsumoto
Keyword(s):
Carbon Nanotube
◽
Ion Implantation
◽
Fermi Level
◽
Ion Beam
◽
Low Energy
◽
Single Walled Carbon Nanotube
◽
Single Walled Carbon
◽
Oxygen Ion
◽
Oxygen Ion Implantation
Download Full-text
Analysis of thin‐film silicon‐on‐insulator structures formed by low‐energy oxygen ion implantation
Journal of Applied Physics
◽
10.1063/1.349257
◽
1991
◽
Vol 70
(7)
◽
pp. 3605-3612
◽
Cited By ~ 33
Author(s):
Y. Li
◽
J. A. Kilner
◽
A. K. Robinson
◽
P. L. F. Hemment
◽
C. D. Marsh
Keyword(s):
Thin Film
◽
Ion Implantation
◽
Low Energy
◽
Silicon On Insulator
◽
Oxygen Ion
◽
Thin Film Silicon
◽
Oxygen Ion Implantation
Download Full-text
Optical waveguide with homogeneous refractive index profile in LiNbO3 by double-low-energy Oxygen ion implantation
Applied Surface Science
◽
10.1016/j.apsusc.2011.06.063
◽
2011
◽
Vol 257
(24)
◽
pp. 10342-10345
◽
Cited By ~ 1
Author(s):
S.-M. Zhang
◽
K.-M. Wang
◽
X.-H. Liu
◽
X.-B. Ming
Keyword(s):
Refractive Index
◽
Ion Implantation
◽
Optical Waveguide
◽
Refractive Index Profile
◽
Low Energy
◽
Index Profile
◽
Oxygen Ion
◽
Oxygen Ion Implantation
Download Full-text
Water protective surface layer on fluorozirconate glass produced by low‐energy oxygen ion implantation
Applied Physics Letters
◽
10.1063/1.104656
◽
1991
◽
Vol 58
(4)
◽
pp. 422-424
◽
Cited By ~ 5
Author(s):
Yisheng Dai
◽
Toshiyasu Kawaguchi
◽
Koichi Suzuki
◽
Susumu Suzuki
◽
Kiyoshi Yamamoto
◽
...
Keyword(s):
Surface Layer
◽
Ion Implantation
◽
Low Energy
◽
Oxygen Ion
◽
Fluorozirconate Glass
◽
Oxygen Ion Implantation
Download Full-text
Formation of ultra-thin silicon-on-insulator materials by low-dose low-energy oxygen ion implantation
Chemical Physics Letters
◽
10.1016/s0009-2614(02)01666-4
◽
2003
◽
Vol 367
(1-2)
◽
pp. 44-48
◽
Cited By ~ 6
Author(s):
Xiang Wang
◽
Jing Chen
◽
Yemin Dong
◽
Meng Chen
◽
Xi Wang
Keyword(s):
Ion Implantation
◽
Low Dose
◽
Low Energy
◽
Silicon On Insulator
◽
Oxygen Ion
◽
Thin Silicon
◽
Oxygen Ion Implantation
Download Full-text
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