Electron beam nitriding of titanium in medium vacuum

2019 ◽  
Vol 358 ◽  
pp. 726-731 ◽  
Author(s):  
V.A. Burdovitsin ◽  
D.A. Golosov ◽  
E.M. Oks ◽  
A.V. Tyunkov ◽  
Yu.G. Yushkov ◽  
...  
Keyword(s):  
Vacuum ◽  
2019 ◽  
Vol 163 ◽  
pp. 31-36 ◽  
Author(s):  
A.V. Tyunkov ◽  
V.A. Burdovitsin ◽  
E.M. Oks ◽  
Yu.G. Yushkov ◽  
D.B. Zolotukhin

2020 ◽  
Vol 383 ◽  
pp. 125241 ◽  
Author(s):  
A.V. Tyunkov ◽  
D.A. Golosov ◽  
D.B. Zolotukhin ◽  
A.V. Nikonenko ◽  
E.M. Oks ◽  
...  
Keyword(s):  

2020 ◽  
Vol 127 (11) ◽  
pp. 113303 ◽  
Author(s):  
Yury G. Yushkov ◽  
Denis B. Zolotukhin ◽  
Efim M. Oks ◽  
Andrey V. Tyunkov

2019 ◽  
Vol 26 (5) ◽  
pp. 053512 ◽  
Author(s):  
D. B. Zolotukhin ◽  
V. A. Burdovitsin ◽  
E. M. Oks ◽  
A. V. Tyunkov ◽  
Yu. G. Yushkov

Vacuum ◽  
2021 ◽  
Vol 187 ◽  
pp. 110120
Author(s):  
V.A. Burdovitsin ◽  
K.I. Karpov ◽  
E.M. Oks ◽  
D.B. Zolotukhin

2021 ◽  
Vol 2064 (1) ◽  
pp. 012117
Author(s):  
A A Zenin ◽  
I Y Bakeev ◽  
A S Klimov

Abstract The article presents the results of experiments aimed at studying the effect of low-energy thermoelectrons on the parameters of the beam plasma and plasma of the beam-plasma discharge generated during the transportation of a powerful electron beam in the pressure range of the medium vacuum. It is shown that the injection of a sufficiently small current of low-energy thermoelectrons is capable of violating the conditions for the combustion of the beam-plasma discharge and reducing the power loss of the electron beam for SPR generation. In this case, the plasma concentration decreases by almost an order of magnitude (to 1015 m–3) and the temperature of plasma electrons decreases by almost three (to 0.3 eV).


Vacuum ◽  
1966 ◽  
Vol 16 (6) ◽  
pp. 315
Author(s):  
HA James ◽  
JL Solomon

2021 ◽  
Vol 2064 (1) ◽  
pp. 012073
Author(s):  
D Zolotukhin ◽  
A Tyunkov ◽  
Y Yushkov

Abstract By electron-beam evaporation of a solid state dielectrics (alumina ceramics) and a magnetic material (steel-3) in fore-vacuum, thin films of several μm, possessing both dielectric and magnetic properties, were deposited on a substrate. The work shows that the microstrip resonator method can be used to assess the presence of magnetic properties in films.


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