scholarly journals Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S2O82−-Fe2+ based slurry

2017 ◽  
Vol 110 ◽  
pp. 441-450 ◽  
Author(s):  
Xiaolei Shi ◽  
Chunli Zou ◽  
Guoshun Pan ◽  
Hua Gong ◽  
Li Xu ◽  
...  
Keyword(s):  
Gallium Nitride ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing

Chemical Mechanical Polishing of Gallium Nitride with Colloidal Silica

2011 ◽  
Vol 158 (12) ◽  
pp. H1206 ◽  
Author(s):  
Hideo Aida ◽  
Hidetoshi Takeda ◽  
Koji Koyama ◽  
Haruji Katakura ◽  
Kazuhiko Sunakawa ◽  
...  
Keyword(s):  
Gallium Nitride ◽  
Chemical Mechanical Polishing ◽  
Colloidal Silica ◽  
Mechanical Polishing

Cooperative Roles of Chemical Reactions and Mechanical Friction in Chemical Mechanical Polishing of Gallium Nitride Assisted by OH Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations

2021 ◽  
Author(s):  
Kentaro Kawaguchi ◽  
Yang Wang ◽  
Jingxiang Xu ◽  
Yusuke Ootani ◽  
Yuji Higuchi ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Gallium Nitride ◽  
Chemical Mechanical Polishing ◽  
Quantum Chemical ◽  
Laser Diodes ◽  
Tight Binding ◽  
Mechanical Polishing ◽  
Oh Radicals ◽  
Dynamics Simulations ◽  
Quantum Chemical Molecular Dynamics

Chemical mechanical polishing (CMP) is a key manufacturing process for applying gallium nitride (GaN), especially the Ga-face GaN, to semiconductor devices such as laser diodes. However, the CMP efficiency for...

Chemical Mechanical Polishing of Gallium Nitride

2002 ◽  
Vol 5 (8) ◽  
pp. G61 ◽  
Author(s):  
P. R. Tavernier ◽  
T. Margalith ◽  
L. A. Coldren ◽  
S. P. DenBaars ◽  
D. R. Clarke
Keyword(s):  
Gallium Nitride ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing
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