Correlation of compositional and structural changes during pulsed laser deposition of tantalum oxide films

2004 ◽  
Vol 453-454 ◽  
pp. 245-250 ◽  
Author(s):  
Zs Geretovszky ◽  
T Szörényi ◽  
J.-P Stoquert ◽  
I.W Boyd
Keyword(s):  
Pulsed Laser Deposition ◽  
Structural Changes ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition

Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition

2009 ◽  
Vol 478 (1-2) ◽  
pp. 453-457 ◽  
Author(s):  
Xiliang He ◽  
Jiehua Wu ◽  
Xiaomin Li ◽  
Xiangdong Gao ◽  
Xiaoyan Gan ◽  
...  
Keyword(s):  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Post Annealing

Synthesis and optical properties of tantalum oxide films prepared by ionized plasma-assisted pulsed laser deposition

2008 ◽  
Vol 147 (3-4) ◽  
pp. 90-93 ◽  
Author(s):  
Xiliang He ◽  
Jiehua Wu ◽  
Lili Zhao ◽  
Jia Meng ◽  
Xiangdong Gao ◽  
...  
Keyword(s):  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition

Characterization of tantalum oxide films grown by pulsed laser deposition

1999 ◽  
Vol 120-121 ◽  
pp. 757-764 ◽  
Author(s):  
S. Boughaba ◽  
M.U. Islam ◽  
G.I. Sproule ◽  
M.J. Graham
Keyword(s):  
Pulsed Laser Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition

Large-Area Pulsed Laser Deposition of Tantalum Oxide Films

1999 ◽  
Vol 567 ◽  
Author(s):  
S. Boughaba ◽  
M. U. Islam ◽  
G. I. Sproule ◽  
M. J. Graham
Keyword(s):  
Laser Beam ◽  
Pulsed Laser Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Large Area ◽  
Composition Structure ◽  
Krf Excimer Laser

ABSTRACTA large-area pulsed laser deposition (PLD) technique was used to uniformly grow tantalum pentoxide (Ta2O5) films on silicon wafers of 75 mm diameter. A KrF excimer laser beam was focused onto a 90 mm diameter Ta2O5 target to induce its ablation in oxygen gas ambient. The large-area coverage was obtained by rastering the laser beam over the radius of the rotating target, while the substrate was rotated simultaneously.The tantalum oxide films were characterized in terms of uniformity of thickness, composition, structure, and optical properties across the substrate. Average deviations typically below 1% were achieved in thickness, composition, indices of refraction and optical energy band-gap. Identical X-ray diffraction spectra were obtained at the center, middle of radius and edge of the wafers.

Transition metal oxide films prepared by pulsed laser deposition for atomic beam detection

1996 ◽  
Vol 281-282 ◽  
pp. 453-456 ◽  
Author(s):  
M. Tanaka ◽  
M. Mukai ◽  
Y. Fujimori ◽  
M. Kondoh ◽  
Y. Tasaka ◽  
...  
Keyword(s):  
Transition Metal ◽  
Metal Oxide ◽  
Pulsed Laser Deposition ◽  
Atomic Beam ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Transition Metal Oxide ◽  
Laser Deposition ◽  
Metal Oxide Films

scholarly journals Ultra Thin Al-doped Transparent Conducting Zinc Oxide Films Fabricated by Pulsed Laser Deposition Method

2008 ◽  
Vol 51 (5) ◽  
pp. 323-325 ◽  
Author(s):  
Masataka NAKAMURA ◽  
Kimihiro IKUTA ◽  
Takanori AOKI ◽  
Akio SUZUKI ◽  
Tatsuhiko MATSUSHITA ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Pulsed Laser Deposition ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Method ◽  
Zinc Oxide Films ◽  
Transparent Conducting
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