Effect of nitrogen content on mechanical properties and tribological behaviors of hydrogenated amorphous carbon films prepared by ion beam assisted chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.02.098 ◽

2004 ◽

Vol 466 (1-2) ◽

pp. 137-150 ◽

Author(s):

Jen Fin Lin ◽

Zer Chuan Wan ◽

Pal Jen Wei ◽

Hsiao Yeh Chu ◽

Chi Fong Ai

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Nitrogen Content ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Ion Beam ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous

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The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Structural, bonding and physical characteristics of phosphorus-doped hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.11.138 ◽

2005 ◽

Vol 482 (1-2) ◽

pp. 280-286 ◽

Author(s):

Mohamad Rusop ◽

Tetsuo Soga ◽

Takashi Jimbo

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Physical Characteristics ◽

Amorphous Carbon Films ◽

Structural Bonding ◽

Phosphorus Doped ◽

Hydrogenated Amorphous

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Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

Thin Solid Films ◽

10.1016/s0040-6090(01)01193-2 ◽

2001 ◽

Vol 394 (1-2) ◽

pp. 114-123 ◽

Author(s):

M Lindstam

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Temperature Deposition ◽

Hydrogenated Amorphous

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Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2008.06.136 ◽

2008 ◽

Vol 255 (5) ◽

pp. 1836-1840 ◽

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Stress Relief ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Electrochimica Acta ◽

10.1016/j.electacta.2010.11.006 ◽

2011 ◽

Vol 56 (3) ◽

pp. 1172-1181 ◽

Author(s):

Yoriko Tanaka ◽

Masahiro Furuta ◽

Koichi Kuriyama ◽

Ryosuke Kuwabara ◽

Yukiko Katsuki ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrochemical Properties ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Effect of pressure on the deposition of hydrogenated amorphous carbon films using the electron cyclotron resonance chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581073 ◽

1998 ◽

Vol 16 (2) ◽

pp. 572-577 ◽

Author(s):

Rusli ◽

S. F. Yoon ◽

H. Yang ◽

Q. Zhang ◽

J. Ahn ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Effect Of Pressure ◽

Hydrogenated Amorphous

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Influence of Fe-doped on structural, electronic structural and optical properties of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapor deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2009.08.005 ◽

2009 ◽

Vol 487 (1-2) ◽

pp. 522-526 ◽

Author(s):

Hongliang Zhang ◽

Weidong Wu ◽

Wei Wang ◽

Chengshi Gong ◽

Zhibing He ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Structural And Optical Properties ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Fracture toughness, hardness and elastic modulus of hydrogenated amorphous carbon films deposited by chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.342 ◽

2006 ◽

Vol 496 (2) ◽

pp. 481-488 ◽

Author(s):

M.D. Michel ◽

L.V. Muhlen ◽

C.A. Achete ◽

C.M. Lepienski

Keyword(s):

Fracture Toughness ◽

Chemical Vapor Deposition ◽

Elastic Modulus ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Influence of temperature on the hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3497025 ◽

2010 ◽

Vol 28 (6) ◽

pp. 1363-1365 ◽

Author(s):

Jiung Wu ◽

Yi-Lung Cheng ◽

Ming-Kai Shiau

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Influence Of Temperature ◽

Hydrogenated Amorphous Carbon ◽

Influence Of Temperature On ◽

Hydrogenated Amorphous

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On the microstructural, optical, and thermal properties of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.354358 ◽

1993 ◽

Vol 74 (7) ◽

pp. 4673-4680 ◽

Author(s):

L. H. Chou ◽

H. W. Wang

Keyword(s):

Thermal Properties ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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