Effect of assist ion beam voltage on intrinsic stress and optical properties of Ta2O5 thin films deposited by dual ion beam sputtering

2008 ◽  
Vol 516 (11) ◽  
pp. 3582-3585 ◽  
Author(s):  
S.G. Yoon ◽  
S.M. Kang ◽  
W.S. Jung ◽  
S.-W. Kim ◽  
D.H. Yoon
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Ion Beam ◽  
Intrinsic Stress ◽  
Ion Beam Sputtering ◽  
Beam Voltage ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Comparision of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering

2005 ◽  
Vol 118 (1-3) ◽  
pp. 234-237 ◽  
Author(s):  
S.G. Yoon ◽  
Y.T. Kim ◽  
H.K. Kim ◽  
M.J. Kim ◽  
H.M. Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Optical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Epitaxial growth of MgO thin films on silicon by dual ion beam sputtering

1993 ◽  
Vol 223 (1) ◽  
pp. 11-13 ◽  
Author(s):  
Yijie Li ◽  
Guangcheng Xiong ◽  
Guijun Lian ◽  
Jie Li ◽  
Zizhao Gan
Keyword(s):  
Thin Films ◽  
Epitaxial Growth ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Hard BCxNy thin films grown by dual ion beam sputtering

2006 ◽  
Vol 515 (1) ◽  
pp. 207-211 ◽  
Author(s):  
C. Morant ◽  
P. Prieto ◽  
J. Bareño ◽  
J.M. Sanz ◽  
E. Elizalde
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Argon ion beam voltage in a dual ion beam sputtering system influence on the aluminum nitride films microstructure

Vacuum ◽  
2005 ◽  
Vol 78 (2-4) ◽  
pp. 539-543 ◽  
Author(s):  
Sheng Han ◽  
Hong-Ying Chen ◽  
Han C. Shih
Keyword(s):  
Aluminum Nitride ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Voltage ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Argon Ion ◽  
Sputtering System

Room temperature synthesis of boron nitride thin films by dual-ion beam sputtering deposition

2016 ◽  
Vol 42 (3) ◽  
pp. 4171-4175 ◽  
Author(s):  
Z.F. Wu ◽  
L. Guo ◽  
K. Cheng ◽  
F. Zhang ◽  
R.F. Guan
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Room Temperature ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Temperature Synthesis ◽  
Sputtering Deposition ◽  
Room Temperature Synthesis ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Processing of La1.8Sr0.2CuO4and YBa2Cu3O7superconducting thin films by dual‐ion‐beam sputtering

1988 ◽  
Vol 63 (6) ◽  
pp. 2046-2053 ◽  
Author(s):  
P. Madakson ◽  
J. J. Cuomo ◽  
D. S. Yee ◽  
R. A. Roy ◽  
G. Scilla
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Aluminum nitride films synthesized by dual ion beam sputtering

2004 ◽  
Vol 19 (12) ◽  
pp. 3521-3525 ◽  
Author(s):  
Sheng Han ◽  
Hong-Ying Chen ◽  
Chih-Hsuan Cheng ◽  
Jian-Hong Lin ◽  
Han C. Shih
Keyword(s):  
Crystal Structure ◽  
Aluminum Nitride ◽  
Ion Beam ◽  
Diffraction Field ◽  
Ion Beam Sputtering ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Beam Voltage ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Aluminum nitride films were deposited by varying the voltages of argon ion beams from 400 to 1200 V in dual ion beam sputtering. The crystal structure, microstructure, and elemental distributions of the aluminum nitride films were analyzed by x-ray diffraction, field emission scanning electron microscopy, and secondary ion mass spectroscopy, respectively. The aluminum nitride films exhibited the 〈002〉 preferred orientation at an optimal ion beam voltage of 800 V. The orientation changed to a mixture of {100} and {002} planes above 800 V, accounting for radiation damage. The thickness of the film increases with increasing ion beam voltage, reaching a steady state value of 210 nm at an ion beam voltage of 1200 V. Under optimal condition (800 V), the c-axis orientation of the aluminum nitride 〈002〉 film was obtained with a dense and high-quality crystal structure.

Iron Thin Films by Means of Dual Ion-Beam Sputtering

1985 ◽  
Vol 1 (4) ◽  
pp. 488-490
Author(s):  
M. Yamaga ◽  
N. Terada ◽  
M. Naoe
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Optical Properties of TiO^2-SiO^2 Mixture Thin Films Produced by Ion-Beam Sputtering

2007 ◽  
Author(s):  
Tatiana V. Amotchkina ◽  
Detlev Ristau ◽  
Marc Lappschies ◽  
Marco Jupe ◽  
Alexander V. Tikhonravov ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering
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